SEMICONDUCTOR DEVICE
The semiconductor device includes a substrate made of a semi-insulating compound semiconductor, a first optical active element formed on the substrate, a second optical active element formed on the substrate, and an optical waveguide that optically connects the first optical active element and the second optical active element. The semiconductor device further includes an etching stop layer formed over the entire region on the substrate. The first optical active element, the optical waveguide, and the second optical active element are formed on the etching stop layer.
1 - 5 . (canceled)
6 . A semiconductor device comprising:
a substrate made of a semi-insulating compound semiconductor;
a first optical active element on the substrate, the first optical active element including a first lower semiconductor layer of a first conductivity type, a first active layer on the first lower semiconductor layer, and a first upper semiconductor material of a second conductivity type on the first active layer;
a second optical active element on the substrate, the second optical active element including a second lower semiconductor layer of the first conductivity type, a second active layer on the second lower semiconductor layer, and a second upper semiconductor material on the second active layer; and
an optical waveguide on the substrate and disposed between the first optical active element and the second optical active element, the optical waveguide including a semi-insulating or undoped third lower semiconductor layer, a third active layer on the third lower semiconductor layer, and a third upper semiconductor material on the third active layer, wherein the optical waveguide provides an electric separation part between the first optical active element and the second optical active element, and the optical waveguide optically connects the first optical active element and the second optical active element.
7 . The semiconductor device according to claim 6 , further comprising:
an etching stop layer over an entire region of the substrate,
wherein the first optical active element, the optical waveguide, and the second optical active element are each disposed on the etching stop layer.
8 . The semiconductor device according to claim 7 , wherein:
the third active layer has a thickness equal to or greater than a thickness of the first active layer; and
a total thickness of the third lower semiconductor layer and the third active layer is equal to or greater than a total thickness of the first lower semiconductor layer and the first active layer.
9 . The semiconductor device according to claim 8 , wherein:
the thickness of the third active layer is equal to or greater than a thickness of the second active layer; and
the total thickness of the third lower semiconductor layer and the third active layer is equal to or greater than a total thickness of the second lower semiconductor layer and the second active layer.
10 . The semiconductor device according to claim 7 , wherein:
a width of the third active layer in a waveguide direction is equal to or greater than a width of the first active layer in the waveguide direction.
11 . The semiconductor device according to claim 10 , wherein:
the width of the third active layer in the waveguide direction is equal to or greater than a width of the second active layer in the waveguide direction.
12 . The semiconductor device according to claim 6 , wherein
the first optical active element is configured to be DC driven, and
the second optical active element is configured such that a differential modulation signal is applied between the second lower semiconductor layer and the second upper semiconductor material in a region of the second optical active element.
13 . The semiconductor device according to claim 6 , wherein:
the third active layer has a thickness equal to or greater than a thickness of the first active layer; and
a total thickness of the third lower semiconductor layer and the third active layer is equal to or greater than a total thickness of the first lower semiconductor layer and the first active layer.
14 . The semiconductor device according to claim 13 , wherein:
the thickness of the third active layer is equal to or greater than a thickness of the second active layer; and
the total thickness of the third lower semiconductor layer and the third active layer is equal to or greater than a total thickness of the second lower semiconductor layer and the second active layer.
15 . The semiconductor device according to claim 6 , wherein:
a width of the third active layer in a waveguide direction is equal to or greater than a width of the first active layer in the waveguide direction.
16 . The semiconductor device according to claim 15 , wherein:
the width of the third active layer in the waveguide direction is equal to or greater than a width of the second active layer in the waveguide direction.
17 . A semiconductor device comprising:
a substrate made of a semi-insulating compound semiconductor;
a first optical active element on the substrate, the first optical active element including a first lower semiconductor layer, a first active layer on the first lower semiconductor layer, and an upper semiconductor layer on the first active layer, wherein the first lower semiconductor layer and the upper semiconductor layer have opposite conductivity types;
a second optical active element on the substrate, the second optical active element including a second lower semiconductor layer and a second active layer on the second lower semiconductor layer; and
an optical waveguide on the substrate and optically connecting the first optical active element and the second optical active element, the optical waveguide including third lower semiconductor layer and a third active layer on the third lower semiconductor layer, wherein the optical waveguide provides an electric separation part between the first optical active element and the second optical active element.
18 . The semiconductor device of claim 17 , wherein the third lower semiconductor layer is a semi-insulating or undoped.
19 . The semiconductor device according to claim 17 , further comprising:
an etching stop layer over an entire region of the substrate,
wherein the first optical active element, the optical waveguide, and the second optical active element are each disposed on the etching stop layer.
20 . The semiconductor device according to claim 17 , wherein:
the third active layer has a thickness equal to or greater than a thickness of the first active layer a thickness of the second active layer; and
a total thickness of the third lower semiconductor layer and the third active layer is equal to or greater than a total thickness of the first lower semiconductor layer and the first active layer and a total thickness of the second lower semiconductor layer and the second active layer.
21 . The semiconductor device according to claim 17 , wherein:
a width of the third active layer in a waveguide direction is equal to or greater than a width of the first active layer and a width of the second active layer in the waveguide direction.
22 . The semiconductor device according to claim 17 , wherein
the first optical active element is configured to be DC driven, and
the second optical active element is configured such that a differential modulation signal is applied between the second lower semiconductor layer and the upper semiconductor layer in a region of the second optical active element.
23 . The semiconductor device according to claim 17 , wherein the upper semiconductor layer is further disposed on the second active layer and the third active layer.