MEASUREMENT APPARATUS, MEASUREMENT COMPENSATION APPARATUS AND MEASUREMENT METHOD
There is provided a measurement apparatus including: an interference waveform generating unit that generates an interference waveform signal corresponding to interference light of first light with second light received by an imaging surface; a distribution measurement unit that measures a first optical electric-field distribution of an intensity and a phase of the first light at the imaging surface, based on the interference waveform signal; a distribution simulation unit that simulates second optical electric-field distributions of the intensity and the phase of the first light at a plurality of planes having different distances from the imaging surface in a direction opposite to a propagation direction of the first light propagated from an end surface of an optical waveguide, based on the measured first optical electric-field distribution; a selection unit that selects, from the plurality of planes, a plane at which an area of a region of the simulated second optical electric-field distributions is minimized; and an output unit that outputs information of the simulated second optical electric-field distributions at the selected plane to a predetermined device.
1 . A measurement apparatus comprising:
an interference waveform generator that generates an interference waveform signal corresponding to interference light of first light with second light received by an imaging surface;
a distribution measurer that measures a first optical electric-field distribution of an intensity and a phase of the first light at the imaging surface, based on the interference waveform signal;
a distribution simulator that simulates second optical electric-field distributions of the intensity and the phase of the first light at a plurality of planes having different distances from the imaging surface in a direction opposite to a propagation direction of the first light propagated from an end surface of an optical waveguide, based on the measured first optical electric-field distribution;
a selector that selects, from the plurality of planes, a plane at which an area of a region of the simulated second optical electric-field distributions is minimized; and
an outputter that outputs information of the simulated second optical electric-field distributions on the selected plane to a predetermined device.
2 . The measurement apparatus according to claim 1 , wherein the outputter outputs information on a propagation distance from the selected plane to the imaging surface to the predetermined device.
3 . The measurement apparatus according to claim 1 , wherein the distribution measurer measures the first optical electric-field distribution, based on the interference waveform signal of digital holography.
4 . The measurement apparatus according to claim 1 , wherein the imaging surface receives the first light propagated from the end surface of the optical waveguide without passing through an imaging optical system.
5 . A measurement compensation device comprising:
a distribution measurer that measures a first optical electric-field distribution of an intensity and a phase of first light at an imaging surface, based on an interference waveform signal corresponding to interference light of the first light and second light received at the imaging surface;
a distribution simulator that simulates second optical electric-field distributions of the intensity and the phase of the first light at a plurality of planes having different distances from the imaging surface in a direction opposite to a propagation direction of the first light propagated from an end surface of an optical waveguide, based on the measured first optical electric-field distribution;
a selector that selects, from the plurality of planes, a plane at which an area of a region of the simulated second optical electric-field distributions is minimized; and
an outputter that outputs information of the simulated second optical electric-field distributions at the selected plane to a predetermined device.
6 . A measurement method performed by a measurement apparatus, the measurement method comprising:
generating an interference waveform signal corresponding to interference light of first light with second light received by an imaging surface;
measuring a first optical electric-field distribution of an intensity and a phase of the first light at the imaging surface, based on the interference waveform signal;
simulating second optical electric-field distributions of the intensity and the phase of the first light at a plurality of planes having different distances from the imaging surface in a direction opposite to a propagation direction of the first light propagated from an end surface of an optical waveguide, based on the measured first optical electric-field distribution;
selecting, from the plurality of planes, a plane at which an area of a region of the simulated second optical electric-field distributions is minimized; and
outputting information of the simulated second optical electric-field distributions at the selected plane to a predetermined device.