Deep temperature measuring device and deep temperature measuring method
Provided is a deep temperature measuring device and a deep temperature measuring method capable of measuring a deep temperature of a measured object with high precision, high accuracy, and high-speed responsiveness. The above-described problem is solved by a deep temperature measuring device comprising a thermosensitive part (Ts) that senses temperature, a measurement thin film thermistor capable of measuring temperature by the thermosensitive part (Ts) being brought into contact with a measured object, a heating element layer that heats the measurement thin film thermistor, a control thin film thermistor disposed sandwiching a first heat-insulating layer with the measurement thin film thermistor and the control thin film thermistor and configured to control a temperature of the heating element layer so that the temperature is equal to a temperature of the measurement thin film thermistor, and a second heat-insulating layer that covers the heating element layer.
1. A deep temperature measuring device comprising:
a layered structure including
a thermosensitive part that senses temperature and includes a measurement thin film thermistor capable of measuring temperature by being brought into contact with a measured object,
a control thin film thermistor disposed sandwiching a first heat-insulating layer with the measurement thin film thermistor and configured to control a temperature of a heating element layer that heats the measurement thin film thermistor so that temperatures of the heating element layer and the measurement thin film thermistor are made equal, and
a second heat-insulating layer that covers the heating element layer and the control thin film thermistor on the first heat-insulating layer,
the first heat-insulating layer and the control thin film thermistor being layered in this order on the measurement thin film thermistor,
a cover layer being provided that insulates and covers a mounting side of a circuit board on which the measurement thin film thermistor is mounted and serves as an exposed portion by not covering a mounting portion of the measurement thin film thermistor, thereby allowing the first heat-insulating layer to be layered directly on the measurement thin film thermistor without the cover layer being interposed therebetween, and
the measurement thin film thermistor and the control thin film thermistor each including a substrate, and a thin film element layer and an electrode layer formed on this substrate, the thin film element layer and the electrode layer of the measurement thin film thermistor being disposed facing a contact surface that is the measured object.
2. The deep temperature measuring device according to claim 1 , wherein
the measurement thin film thermistor and the control thin film thermistor are trimmed to correct resistance values thereof.
3. The deep temperature measuring device according to claim 2 , wherein
a variation in the resistance values of the measurement thin film thermistor and the control thin film thermistor is within a range of less than ±0.5%.
4. The deep temperature measuring device according to claim 1 , wherein
a thickness dimension of the substrate of the measurement thin film thermistor is 0.3 mm or less.
5. The deep temperature measuring device according to claim 1 , wherein
the first heat-insulating layer and the second heat-insulating layer have flexibility.
6. The deep temperature measuring device according to claim 1 , wherein
ratios of a length dimension and a width dimension of the measurement thin film thermistor to a diameter dimension of the first heat-insulating layer are set to 1:10 or greater.
7. The deep temperature measuring device according to claim 1 , wherein
the first heat-insulating layer and the second heat-insulating layer are each provided with an adhesive layer having softness and flexibility.
8. The deep temperature measuring device according to claim 1 , wherein
the second heat-insulating layer is provided with an infrared reflecting layer on a surface thereof.
9. A deep temperature measuring method using a deep temperature measuring device provided with a layered structure including a thermosensitive part that senses temperature and includes a measurement thin film thermistor capable of measuring temperature by being brought into contact with a measured object, a control thin film thermistor disposed sandwiching a first heat-insulating layer with the measurement thin film thermistor and configured to control a temperature of a heating element layer that heats the measurement thin film thermistor so that temperatures of the heating element layer and the measurement thin film thermistor are made equal, and a second heat-insulating layer that covers the heating element layer and the control thin film thermistor on the first heat-insulating layer, the first heat-insulating layer and the control thin film thermistor being layered in this order on the measurement thin film thermistor,
a cover layer being provided that insulates and covers a mounting side of a circuit board on which the measurement thin film thermistor is mounted and serves as an exposed portion by not covering a mounting portion of the measurement thin film thermistor, thereby allowing the first heat-insulating layer to be layered directly on the measurement thin film thermistor without the cover layer being interposed therebetween, and
the measurement thin film thermistor and the control thin film thermistor each including a substrate, and a thin film element layer and an electrode layer formed on this substrate, the thin film element layer and the electrode layer of the measurement thin film thermistor being disposed facing a contact surface that is the measured object,
the deep temperature measuring method comprising:
bringing the thermosensitive part into contact with the measured object;
detecting, by the control thin film thermistor, heat radiated from the measurement thin film thermistor;
controlling a heating temperature of the heating element layer in accordance with a temperature difference between a detected temperature of the measurement thin film thermistor and a detected temperature of the control thin film thermistor;
detecting a thermal equilibrium state in which the temperatures of the measurement thin film thermistor and the control thin film thermistor are equal; and
outputting a measurement result of a deep temperature of the measured object.