APPARATUS FOR ION ENERGY ANALYSIS OF PLASMA PROCESSES

1 . An apparatus for obtaining ion energy distribution, IED, measurements in a plasma processing system comprising:

a substrate for placement in the plasma processing system and exposure to the plasma, the substrate having an ion energy analyser disposed therein for measuring the ion energy distribution at the substrate surface during plasma processing, the ion energy analyser comprising a plurality of conductive grids, and a collection electrode, each conductive grid separated by an insulating layer;

a high voltage generating circuit within the substrate and configured to take the output voltage of a battery to power the high voltage generating circuit and apply a voltage to a first conductive grid of the plurality of conductive grids; and

a resistor in series between the first conductive grid and the high voltage generating circuit.

2 . The apparatus for obtaining IED measurements of claim 1 further comprising a plurality of resistors, one resistor in series between each of the plurality of conductive grids and the high voltage generating circuit.

3 . The apparatus for obtaining IED measurements of claim 1 wherein the voltage applied to the first conductive grid is a descending voltage sweep.

4 . The apparatus for obtaining IED measurements of claim 1 further comprising a battery power supply and a battery manager within the substrate for supplying and controlling voltage to the high voltage generating circuit.

5 . The apparatus for obtaining IED measurements of claim 4 wherein the high voltage generating circuit comprises a low voltage to high voltage transformer feeding a voltage multiplier and the high voltage generating circuit is configured to take the output voltage of the battery manager and supply a descending voltage sweep to the first conductive grid.

6 . The apparatus for obtaining IED measurements of claim 4 wherein the high voltage generating circuit comprises a DC-DC converter and a boost section followed by a voltage multiplier section and the high voltage generating circuit is configured to take the output voltage of the battery manager and supply a descending voltage sweep to the first conductive grid.

7 . The apparatus for obtaining IED measurements of claim 3 wherein the apparatus is configured to sample ion current while the voltage sweep is descending.

8 . The apparatus for obtaining IED measurements claim 1 wherein the high voltage generating circuit comprises a high voltage switch for discharging the first conductive grid to the floating ground of the apparatus.

9 . The apparatus for obtaining IED measurements of claim 8 wherein the voltage generating circuit comprises a resistor in parallel with the high voltage switch.

10 . The apparatus for obtaining IED measurements of claim 9 wherein the resistor determine a discharge time of the voltage.

11 . The apparatus for obtaining IED measurements of claim 1 configured so that the voltage applied to the first conductive grid is continuous.

12 . The apparatus for obtaining IED measurements of claim 1 wherein at least one insulation layer includes a peripheral portion which is of reduced thickness with respect to the remaining portion of the insulation layer.

13 . The apparatus for obtaining IED measurements of claim 12 , wherein the peripheral portion protrudes from the remaining portion of the insulation layer.

14 . The apparatus for obtaining IED measurements of claim 12 , wherein recessed portions are provided above and below the peripheral portion.

15 . The apparatus for obtaining IED measurements of claim 12 , wherein the peripheral portion comprises two protruding portions with a recessed portion there between.

16 . The apparatus for obtaining IED measurements of claim 13 , wherein the peripheral portion comprises two protruding portions with a recessed portion there between.

17 . The apparatus for obtaining IED measurements of claim 14 , wherein the peripheral portion comprises two protruding portions with a recessed portion there between.