Induction Feed Through System
An induction feed through system for treating a flow of material is disclosed, including a high voltage energy source energizing a low-turn coil wrapped about an outer wall of a reaction chamber. The flow of electricity through the low-turn coil in turn energizes a high-turn coil wrapped about an inner wall disposed within the outer wall of the reaction chamber. An electrode assembly disposed within the reaction chamber is electrically coupled to and energized by the high-turn coil, in turn generating plasma in the reaction chamber. The plasma is used to excite a flow of material through the induction feed through system. The electromagnetic properties of the plasma further provide direct feedback to the low-turn and high-turn coils.
1 . A system for providing plasma discharges, comprising:
a reaction zone at least partially enclosed by an outer wall;
a first conductive coil wrapped about the outer wall;
a second conductive coil disposed in the reaction zone, wherein the second coil is at least partially disposed within and overlapping with the first coil; and
an electrode assembly disposed in the reaction zone, wherein the electrode assembly is connected to the second coil.
2 . The system of claim 1 , the reaction zone further comprises an input for receiving a stream into the reaction zone and an output for removing a from the reaction zone.
3 . The system of claim 1 , wherein the first coil is connected to a high-voltage power supply.
4 . The system of claim 1 , wherein the second coil extends coaxially with the first coil.
5 . The system of claim 1 , further comprising an inner chamber defined by an inner wall and disposed in the reaction zone, wherein the second coil is wrapped about the inner chamber.
6 . The system of claim 2 , wherein the stream is a fuel or an industrial fluid.
7 . The system of claim 1 , wherein the first coil has a low-turn count relative to the second coil.
8 . The system of claim 5 , wherein the second coil is connected to the electrode assembly via a conductive feedthrough.
9 . The system of claim 1 , wherein the electrode assembly comprises at least one electrode configured to generate plasma.
10 . A system for providing plasma discharges, comprising:
a reaction zone comprising an outer chamber and an inner chamber that is disposed within a wall of the outer chamber;
a first coil wrapped about the inner chamber;
a second coil at least partially nested within the first coil; and
an electrode assembly disposed within the reaction zone and connected to the second coil.
11 . The system of claim 10 , wherein the first coil is wrapped about the wall of the outer chamber.
12 . The system of claim 10 , wherein the second coil has a high-turn count relative to the first coil.
13 . An electrode assembly comprising:
a first electrode disposed within a reaction zone
a first coil disposed about the reaction zone;
wherein the first electrode is connected to ground and extends coaxially with the first coil; and
a second coil inductively coupled to the first coil and isolated from ground.
14 . The electrode assembly of claim 13 , further comprising a second electrode disposed within the reaction zone and connected to the second coil.
15 . The electrode assembly of claim 13 , wherein the first coil has a low-turn count relative to the second coil.
16 . The electrode assembly of claim 13 , wherein the first coil overlaps the second coil.
17 . The electrode assembly of claim 13 , wherein the second coil is partially nested within the first coil.
18 . The electrode assembly of claim 13 , wherein the first coil extends coaxially with the second coil, and the second coil is disposed within the reaction zone.
19 . The electrode assembly of claim 13 , further comprising an inner chamber disposed within the reaction zone, wherein the second coil is disposed between the inner chamber and the first coil.
20 . The electrode assembly of claim 14 , wherein the first and second electrodes are configured to generate a plasma in the reaction zone.