GAS ANALYSIS SYSTEMS, METHODS, AND REACTORS
Methods, systems, and reactors for chemical vapor infiltration reaction endpoint determination. A system includes a user interface device to enter an inert gas quantity inputted to a reactor, an output device, a hydrogen sensor configured to generate a hydrogen concentration value, a total density sensor configured to generate a total density value, and a processor coupled to the user interface device, the output device, the hydrogen sensor, and the total density sensor. The processor receives the inert gas quantity, the hydrogen concentration value, and the total density value, determines a silicon absorption value based on the received values, generates a signal in response to the silicon absorption value being at or above a predetermined threshold value, and sends the generated signal to the output device. The output device outputs an indication in response to receiving the signal.
1 . A method comprising:
receiving a value of a quantity of an inert gas sent to a reactor;
receiving a hydrogen concentration value sensed at a first exhaust of the reactor;
receiving a total density value sensed at a second exhaust of the reactor;
determining a silicon absorption value based on the value of the quantity of the inert gas, the hydrogen concentration value, and the total density value; and
outputting a process completion indication in response to the silicon absorption value being at or above a predetermined threshold value.
2 . The method of claim 1 , wherein the inert gas is nitrogen.
3 . The method of claim 1 , wherein the threshold value is greater than 30%.
4 . The method of claim 1 , wherein the first exhaust is the same as the second exhaust.
5 . The method of claim 1 , wherein outputting the process completion indication comprises outputting a visual indication, a tactile indication, or an audible indication.
6 . The method of claim 5 , wherein outputting the visual indication comprises activating a light.
7 . The method of claim 5 , wherein outputting the visual indication comprises a changing a presented graphical user interface.
8 . The method of claim 1 , further comprising automatically deactivating the reactor in response to the process completion indication.
9 . A system comprising:
a user interface device configured to allow a user to enter a value of a quantity of an inert gas an inert gas quantity inputted to a reactor;
an output device;
a hydrogen sensor configured to generate a hydrogen concentration value sensed at a first exhaust of the reactor;
a total density sensor configured to generate a total density value sensed at a second exhaust of the reactor; and
a processor coupled to the user interface device, the output device, the hydrogen sensor, and the total density sensor, the processor being configured to:
receive the value of the quantity of the inert gas, the hydrogen concentration value, and the total density value;
determine a silicon absorption value based on the value of the quantity of the inert gas, the hydrogen concentration value, and the total density value;
generate a signal in response to the silicon absorption value being at or above a predetermined threshold value; and
send the generated signal to the output device,
wherein the output device outputs an indication in response to receiving the signal.
10 . The system of claim 9 , wherein the inert gas is nitrogen.
11 . The system of claim 9 , wherein the threshold value is greater than 30%.
12 . The system of claim 9 , wherein the first exhaust is the same as the second exhaust.
13 . The system of claim 9 , wherein the output device is configured to output a visual indication, a tactile indication, or an audible indication.
14 . The system of claim 12 , wherein the visual indication comprises an activated light.
15 . The system of claim 12 , wherein the visual indication comprises a change of a presented graphical user interface.
16 . The system of claim 12 , further the processor is further configured to send the generated signal to a controller of the reactor.
17 . A reactor comprising:
a chamber including an exhaust, the chamber is configured to:
receive an inert gas, silane, and a porous carbon material; and
heat the received the inert gas, the silane, and the porous carbon material;
a user interface device configured to allow a user to enter an inert gas quantity inputted to the chamber;
an output device;
a hydrogen sensor configured to generate a hydrogen concentration value sensed at the exhaust of the chamber;
a total density sensor configured to generate a total density value sensed at a second exhaust of the chamber; and
a processor coupled to the user interface device, the output device, the hydrogen sensor, and the total density sensor, the processor being configured to:
receive the entered inert gas quantity, the hydrogen concentration value, and the total density value;
determine a silicon absorption value based on the received inert gas quantity, the hydrogen concentration value, and the total density value;
generate a signal in response to the silicon absorption value being at or above a predetermined threshold value; and
sending the generated signal to the output device,
wherein the output device outputs an indication in response to receiving the signal.
18 . The reactor of claim 17 , further comprising a controller configured to control chamber operations, wherein the controller is configured to:
receive the generated signal; and
automatically stop heating operations in response to the received signal.
19 . The reactor of claim 17 , wherein the inert gas is nitrogen.
20 . The reactor of claim 17 , wherein the output device is configured to output a visual indication, a tactile indication, or an audible indication.