METHOD OF MANUFACTURING A METABOLIC SENSOR
A method of manufacturing a metabolic sensor includes assembling a working wire for a metabolic sensor and exposing the interference layer to an oxidizing agent. The exposing is performed prior to sterilizing the working wire. The assembling comprises forming an interference layer on a substrate, the substrate having an electrically conductive surface; forming an enzyme layer on the interference layer, and forming a glucose limiting layer on the enzyme layer.
1 . A method of manufacturing a metabolic sensor, the method comprising:
assembling a working wire for the metabolic sensor, the assembling comprising:
forming an interference layer on a substrate, the substrate having an electrically conductive surface;
forming an enzyme layer on the interference layer; and
forming a glucose limiting layer on the enzyme layer;
exposing the interference layer to a first oxidizing agent;
sealing the metabolic sensor in a container that is non-sterile; and
sterilizing, by a gas sterilization process, the container having the metabolic sensor;
wherein the exposing the interference layer is performed prior to the sterilizing.
2 . The method of claim 1 , wherein the exposing the interference layer to the first oxidizing agent is performed prior to forming the enzyme layer.
3 . The method of claim 1 , wherein the exposing the interference layer to the first oxidizing agent is performed after forming the enzyme layer, wherein the exposing further comprises exposing the enzyme layer to the first oxidizing agent.
4 . The method of claim 1 , further comprising exposing the enzyme layer to a second oxidizing agent prior to the sterilizing, wherein the second oxidizing agent is different from the first oxidizing agent.
5 . The method of claim 1 , further comprising exposing the glucose limiting layer to the first oxidizing agent prior to the sterilizing.
6 . The method of claim 1 , further comprising exposing the glucose limiting layer to a third oxidizing agent prior to the sterilizing, wherein the third oxidizing agent is different from the first oxidizing agent.
7 . The method of claim 1 , wherein the first oxidizing agent is ethylene oxide (EtO) in a form of a gas having an EtO concentration greater than or equal to 2500 ppm.
8 . The method of claim 1 , wherein the first oxidizing agent is selected from propylene oxide (CH 3 CHCH 2 O), epichlorohydrin (C 3 H 5 ClO), hydrogen peroxide (H 2 O 2 ), peracetic acid (C 2 H 4 O 3 ), or a Brønsted acid.
9 . The method of claim 8 , wherein the first oxidizing agent is the H 2 O 2 in a form of a gas having a H 2 O 2 concentration of greater than or equal to 1200 ppm.
10 . The method of claim 1 , wherein the first oxidizing agent is a Lewis acid.
11 . The method of claim 1 , wherein the first oxidizing agent is a liquid.
12 . The method of claim 11 , wherein the exposing the interference layer to the first oxidizing agent comprises dipping or spraying.
13 . The method of claim 1 , wherein the interference layer comprises pyrrole and phenylenediamine (PDA).
14 . A method of manufacturing for a metabolic sensor, the method comprising:
forming an interference layer on a substrate, the substrate having an electrically conductive surface;
forming an enzyme layer on the interference layer;
forming a glucose limiting layer on the enzyme layer; and
exposing at least one of the interference layer, the enzyme layer, or the glucose limiting layer to a first oxidizing agent;
wherein the substrate with the interference layer, the enzyme layer, and the glucose limiting layer forms a working wire for the metabolic sensor, and wherein the exposing is performed prior to sterilizing the working wire.
15 . The method of claim 14 , wherein the exposing comprises exposing the interference layer to the first oxidizing agent prior to forming the enzyme layer.
16 . The method of claim 14 , wherein the exposing comprises exposing the interference layer and the enzyme layer to the first oxidizing agent.
17 . The method of claim 16 , wherein the enzyme layer is exposed to a second oxidizing agent that is different from the first oxidizing agent.
18 . The method of claim 14 , wherein the first oxidizing agent is ethylene oxide (EtO) in a form of a gas having an EtO concentration greater than or equal to 2500 ppm.
19 . The method of claim 14 , wherein the first oxidizing agent is selected from propylene oxide (CH 3 CHCH 2 O), epichlorohydrin (C 3 H 5 ClO), hydrogen peroxide (H 2 O 2 ), peracetic acid (C 2 H 4 O 3 ), or a Brønsted acid.
20 . The method of claim 19 , wherein the first oxidizing agent is the H 2 O 2 in a form of a gas having a H 2 O 2 concentration of greater than or equal to 1200 ppm.