WORKING WIRE FOR A CONTINUOUS GLUCOSE MONITORING SENSOR
A method of manufacturing a working wire for a continuous glucose monitoring sensor includes receiving a substrate in a wound configuration. The substrate consists of a cobalt-chromium (Co—Cr) alloy. The substrate is unwound from the wound configuration. The substrate is allowed to naturally transition to a straight, linear configuration. A platinum layer is formed on the substrate. A membrane layer comprising a biological membrane is applied over the platinum layer. The working wire is formed to have a diameter in a range from 0.0025 inches to 0.005 inches. A working wire for a continuous glucose monitoring sensor includes a substrate consisting of a cobalt-chromium (Co—Cr) alloy, a platinum layer disposed on the substrate and a membrane layer comprising a biological membrane disposed over the platinum layer. A diameter of the working wire is in a range from 0.0025 inches to 0.005 inches.
1 . A method of manufacturing a working wire for a continuous glucose monitoring sensor, comprising.
receiving a substrate in a wound configuration, the substrate consisting of a cobalt-chromium (Co—Cr) alloy;
unwinding the substrate from the wound configuration;
allowing the substrate to naturally transition to a straight, linear configuration;
forming a platinum layer on the substrate;
applying a membrane layer comprising a biological membrane over the platinum layer; and
forming the working wire to have a diameter in a range from 0.0025 inches to 0.005 inches.
2 . The method of claim 1 , wherein the substrate has been previously formed in a straight, linear position and heat treated or annealed to exhibit a shape memory effect.
3 . The method of claim 1 , wherein the substrate further comprises a core, the core comprising titanium, titanium alloy, Ti-6Al-4V, or vanadium alloy.
4 . The method of claim 1 , further comprising applying a thermal cycle to assist in transitioning the substrate from the wound configuration to the straight, linear configuration, wherein the thermal cycle includes applying a temperature higher than ambient, applying a temperature lower than ambient, or moving ambient air around the substrate.
5 . The method of claim 1 , wherein the substrate is configured to return to the straight, linear configuration upon release of a deforming load.
6 . The method of claim 1 , wherein the substrate has a circular cross-section.
7 . The method of claim 1 , wherein a thickness of the platinum layer is in a range from 20 microns to 100 microns.
8 . The method of claim 1 , wherein the forming the platinum layer comprises a drawn filled tube (DFT) process.
9 . The method of claim 1 , wherein the forming the platinum layer comprises depositing the platinum layer by electroplating.
10 . The method of claim 1 , further comprising shaping a distal end of the working wire to a pointed formation.
11 . A working wire for a continuous glucose monitoring sensor, comprising:
a substrate consisting of a cobalt-chromium (Co—Cr) alloy;
a platinum layer disposed on the substrate; and
a membrane layer comprising a biological membrane disposed over the platinum layer;
wherein a diameter of the working wire is in a range from 0.0025 inches to 0.005 inches.
12 . The working wire of claim 11 , wherein the substrate has been previously formed in a straight, linear position and heat treated or annealed to exhibit a shape memory effect.
13 . The working wire of claim 11 , wherein the substrate comprises a core surrounded by the Co—Cr alloy, the core comprising titanium, titanium alloy, Ti-6Al-4V, or vanadium alloy.
14 . The working wire of claim 11 , wherein the substrate is configured to return to a straight, linear configuration upon release of a deforming load.
15 . The working wire of claim 11 , wherein the working wire is an elongated wire having a circular cross-section.
16 . The working wire of claim 11 , wherein the platinum layer has a thickness in a range from 20 microns to 100 microns.
17 . The working wire of claim 11 , wherein the platinum layer is formed by a drawn filled tube (DFT) process.
18 . The working wire of claim 11 , wherein the platinum layer is deposited by chemical deposition or electroplating.
19 . The working wire of claim 11 , wherein a distal end of the working wire is sharpened to a pointed formation.
20 . The working wire of claim 11 , wherein the membrane layer comprises a polyurethane-based.