SYSTEMS AND METHODS FOR COMPENSATING DISPERSION OF A BEAM SEPARATOR IN A SINGLE-BEAM OR MULTI-BEAM APPARATUS

1 - 15 . (canceled)

16 . A dispersion device for a charged particle beam system, the dispersion device being arranged upstream of a beam separator of the charged particle beam system and comprising:

a combination of an electrostatic deflector and a magnetic deflector configured for inducing a plurality of first beam dispersions to a plurality of beamlets of a charged particle beam, wherein the plurality of first beam dispersions are set to cancel impacts of a plurality of second beam dispersions of the plurality of beamlets of the charged particle beam caused by the beam separator.

17 . The dispersion device of claim 16 , wherein the combination of the electrostatic deflector and the magnetic deflector is configured to generate an electrostatic dipole field and a magnetic dipole field, wherein the electrostatic dipole field and the magnetic dipole field are superposed substantially perpendicular to each other and to an optical axis of the charged particle beam system.

18 . The dispersion device of claim 17 , wherein the electrostatic dipole field and the magnetic dipole field respectively exert a first force and a second force on each of the plurality of beamlets of the charged particle beam propagating along the optical axis, and the first force and the second force are substantially opposite to each other and form the corresponding first beam dispersion.

19 . The dispersion device of claim 17 , wherein a deflection angle of the beam due to the dispersion device is unchanged when the electrostatic dipole field and the magnetic dipole field are adjusted to control the plurality of first beam dispersions changed with respect to the plurality of second beam dispersions.

20 . The dispersion device of claim 19 , wherein the deflection angle is zero.

21 . The dispersion device of claim 18 , further comprising a multi-pole lens configured to generate a quadrupole field to minimize an impact of an astigmatism aberration caused by the first force and the second force.

22 . The dispersion device of claim 21 , wherein the multi-pole lens is included within the dispersion device or the beam separator.

23 . The dispersion device of claim 16 , wherein the charged particle beam is an electron beam.

24 . The dispersion device of claim 16 , wherein the charged particle beam system comprises an electron beam inspection tool.

25 . The dispersion device of claim 16 , wherein the beam separator comprises a Wien filter.

26 . A charged particle beam apparatus comprising:

a source for generating a primary charged particle beam;

a first dispersion device downstream from the source;

a beam separator downstream the first dispersion device;

an objective lens downstream the beam separator;

a sample stage for supporting a sample; and

a charged particle detector,

wherein the first dispersion device comprises a combination of an electrostatic deflector and a magnetic deflector configured for inducing a plurality of first beam dispersions to a plurality of beamlets of the primary charged particle beam, and

wherein the plurality of first beam dispersions are set to minimize impacts of a plurality of second beam dispersions of the plurality of beamlets of the charged particle beam caused by the beam separator.

27 . The charged particle beam apparatus of claim 26 , wherein the combination of the electrostatic deflector and the magnetic deflector is configured to generate an electrostatic dipole field and a magnetic dipole field, wherein the electrostatic dipole field and the magnetic dipole field are superposed substantially perpendicular to each other and to an optical axis of the charged particle beam system.

28 . The charged particle beam apparatus of claim 27 , wherein the electrostatic dipole field and the magnetic dipole field respectively exert a first force and a second force on each of the plurality of beamlets of the charged particle beam propagating along the optical axis, and the first force and the second force are substantially opposite to each other and form the corresponding first beam dispersion.

29 . The charged particle beam apparatus of claim 27 , wherein a deflection angle of the beam due to the dispersion device is unchanged when the electrostatic dipole field and the magnetic dipole field are adjusted to control the plurality of first beam dispersions changed with respect to the plurality of second beam dispersions.

30 . The charged particle beam apparatus of claim 29 , wherein the deflection angle is zero.

31 . The charged particle beam apparatus of claim 26 , wherein the first dispersion device further comprises a multi-pole lens configured to generate a quadrupole field to cancel an impact of an astigmatism aberration caused by the first force and the second force.

32 . The charged particle beam apparatus of claim 31 , wherein the multi-pole lens is included within the dispersion device or the beam separator.

33 . The charged particle beam apparatus of claim 26 , wherein the charged particle beam is an electron beam, and wherein the charged particle beam system comprises an electron beam inspection tool.

34 . The charged particle beam apparatus of claim 26 , wherein the beam separator comprises a Wien filter.

35 . A method for controlling dispersion in a charged particle beam system with a dispersion device, the method comprising:

placing the dispersion device upstream of a beam separator; and

generating a plurality of first beam dispersions to a plurality of beamlets of a charged particle beam by the dispersion device;

wherein the dispersion device comprises a combination of an electrostatic deflector and a magnetic deflector configured for inducing the plurality of first beam dispersions, and

wherein the plurality of first beam dispersions are set to cancel impacts of a plurality of second beam dispersions of the plurality of beamlets of the charged particle beam caused by the beam separator.