IP Library › Patent Application 19474691
Patent Application
App. No. 19/474,691

MOTION-TRACKING AND BLUR COMPENSATION FOR LASER TREATMENT DEVICE

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Quick Facts
Patent No.
US None
App. No.
19/474,691
Abstract

Treatment devices and related methods are provided. The treatment devices include a handpiece configured to deliver electromagnetic radiation (EMR) along an optical axis, a window disposed at an end of the handpiece and intersecting the optical axis, an optical arrangement disposed within the handpiece, an EMR source in communication with the handpiece and configured to emit a treatment radiation through the optical arrangement and the window along the optical axis, and at least one light source disposed in the housing and offset from the optical axis. The window is configured to directly contact tissue. The optical arrangement includes a high NA lens. The at least one light source is configured to illuminate the contacted tissue at a substantially oblique angle and is configured to emit light at a wavelength at a variable wavelength range between about 300 nm and about 650 nm based on a tissue marker in the tissue.

Claims (57)

1 . A treatment system, comprising:

a handpiece having a window disposed at an end thereof, the window being configured to directly contact tissue;

a first electromagnetic radiation (EMR) source in communication with the handpiece, the first EMR source being configured to emit a pulsed treatment radiation along a nominal optical axis through the window;

a second EMR source disposed within the handpiece, the second EMR source being configured to illuminate contacted tissue at an illumination angle substantially oblique to the nominal optical axis;

an optical arrangement disposed within the handpiece, the nominal optical axis extending through the optical arrangement;

a first galvanometer in communication with the optical arrangement, the first galvanometer being configured to adjust a configuration of the optical arrangement; and

a controller in communication with the handpiece and the first EMR source, the controller being configured to manipulate the configuration of the optical arrangement via the first galvanometer to alter an emission angle of the pulsed treatment radiation relative to the nominal optical axis and during a treatment pulse duration of the pulsed treatment radiation, the controller being configured to alter a wavelength of the second EMR source based on a detected tissue marker of contacted tissue.

2 . The treatment system of claim 1 , wherein the second EMR source comprises a plurality of second EMR sources each at a substantially oblique angle relative to the nominal optical axis.

3 . The treatment system of claim 2 , wherein the plurality of second EMR sources are disposed in a substantially ring-shaped geometry surrounding the nominal optical axis.

4 . The treatment system of claim 2 , wherein each of the plurality of second EMR sources is configured to emit light at a discrete wavelength, and wherein at least two sources in the plurality of second EMR sources are configured to emit light at different wavelengths.

5 . The treatment system of claim 1 , wherein the optical arrangement includes an imaging lens configured to receive backscattered light emitted by the second EMR source reflected off the contacted tissue.

6 . The treatment system of claim 5 , wherein the controller is configured to identify the tissue marker based on the received backscattered light.

7 . The treatment system of claim 5 , wherein the imaging lens includes an adjustable iris configured to optimize an f-number of the imaging lens.

8 . The treatment system of claim 5 , wherein the f-number of the imaging lens ranges between about 5.2 and 8.2.

9 . The treatment system of claim 5 , wherein, at marginal focus and quarter wave of spherical aberration, 4λ(F/#) 2 is approximately equal to between 50 μm-120 μm,

wherein:

λ is the one or more discrete wavelengths in nm, and

(F/#) is the f-number of the imaging lens.

10 . The treatment system of claim 1 , wherein the optical arrangement includes a high NA lens having an NA of 0.3 or greater.

11 . The treatment system of claim 1 , wherein the first galvanometer is configured to manipulate the optical arrangement to adjust the emission angle based on a velocity of the window relative to the contacted tissue.

12 . The treatment system of claim 11 , wherein the first galvanometer is configured to manipulate the optical arrangement to adjust the emission angle in at least two degrees of freedom.

13 . The treatment system of claim 1 , further comprising:

a second galvanometer in communication with the optical arrangement,

wherein the first galvanometer is configured to adjust the configuration of the optical arrangement to alter the emission angle about a first axis and the second galvanometer is configured to adjust the configuration of the optical arrangement to alter the emission angle about a second axis, the first axis being substantially perpendicular to the second axis.

14 . A treatment system, comprising:

an elongate housing defining a central longitudinal axis, the elongate housing including a window disposed on the housing and intersecting the central longitudinal axis, the window being configured to contact tissue during a treatment process;

an EMR source operably coupled to in the elongate housing and configured to emit a treatment beam toward the window, the treatment beam being emitted along a treatment path that is substantially parallel to the central longitudinal axis;

at least one light source disposed in the elongate housing and radially offset from the central longitudinal axis, the at least one light source being configured to emit a detection beam toward the window;

an optical arrangement disposed within the elongate housing, the optical arrangement being configured to direct and shape the emitted treatment beam;

a first galvanometer in communication with the optical arrangement, the first galvanometer being configured to adjust a configuration of the optical arrangement; and

a controller in communication with EMR source and the first galvanometer, the controller being configured to manipulate the configuration of the optical arrangement via the first galvanometer to alter an emission angle of the treatment beam relative to the longitudinal axis, the controller being configured to alter a wavelength of the detection beam based on a detected tissue marker of contacted tissue.

15 . The treatment system of claim 14 , wherein the wavelength is adjustable between about 390 nm to 650 nm.

16 . The treatment system 14 , wherein the wavelength is proportional to the detected tissue marker.

17 . The treatment system of claim 14 , wherein at least one light source comprises a plurality of light sources each disposed at a substantially oblique angle relative to the longitudinal axis.

18 . The treatment system of claim 17 , wherein the plurality of light sources are disposed in a substantially ring-shaped geometry.

19 . The treatment system of claim 17 , wherein each of the plurality of light sources is configured to emit light at a discrete wavelength, and wherein at least two light sources in the plurality of light sources are configured to emit light at different discrete wavelengths.

20 . The treatment system of claim 14 , wherein the first galvanometer is configured to manipulate the optical arrangement to adjust the emission angle based on a velocity of the window relative to the contacted tissue.

21 . The treatment system of claim 20 , wherein the first galvanometer is configured to manipulate the optical arrangement to adjust the emission angle in at least two degrees of motion.

22 . The treatment system of claim 14 , wherein the EMR source is configured to deliver the treatment radiation in a pulse duration, wherein the pulse duration ranges between about 3 and 10 ms.

23 . The treatment system of claim 14 , further comprising:

a second galvanometer operatively coupled to the optical arrangement,

wherein the first galvanometer is configured to manipulate the optical arrangement to alter the emission angle about a first axis and the second galvanometer is configured to manipulate the optical arrangement to alter the emission angle about a second axis, the first axis being substantially perpendicular to the second axis.

24 . A method, comprising:

detecting first backscattered light reflected off a first portion of tissue in contact with a laser treatment device, the backscattered light characterizing respective initial positions of one or more points of interest in the first portion relative to the laser treatment device;

moving the laser treatment device from the first portion of the tissue to a second portion of the tissue;

detecting second backscattered light reflected off a second portion of the tissue as the laser treatment device moves from the first portion of the tissue to the second portion of the tissue, the second backscattered light characterizing respective secondary positions of the one or more points of interest in the second portion relative to the laser treatment device;

determining a velocity of the laser treatment device relative to the tissue based upon the respective initial positions and the respective secondary positions of the one or more points of interest;

delivering at least one electromagnetic radiation (EMR) pulse to the tissue with the laser treatment device for a pulse duration while the laser treatment device is moving along the tissue; and

adjusting, based on the determined velocity, an emission angle of the at least one EMR pulse during the pulse duration, the emission angle being defined relative to a nominal optical axis of the laser treatment device.

25 . The method of claim 24 , wherein the at least one laser pulse delivers between about 30 and 150 mJ to the tissue during the pulse duration.

26 . The method of claim 24 , wherein the adjusting comprises changing an orientation of an optical arrangement disposed in the laser treatment device using a first galvanometer.

27 . The method of claim 24 , further comprising:

determining a dwell time based on an amount of energy delivered to the tissue during the pulse duration and a power of the laser treatment device.

28 . The method of claim 27 , further comprising:

determining a velocity compensation vector based on the velocity of the laser treatment device and the determined dwell time; and

adjusting the emission angle based on the determined velocity compensation vector.

29 . The method of claim 27 , wherein the velocity compensation vector is determined between about every 50 to 100 ms.

Assignments (2)
SECURITY INTEREST Recorded Sep 16, 2026
From: AVAVA, INC.
To: ANKURA TRUST COMPANY, LLC
Reel/Frame 076040/0615 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 15, 2026
From: BHAWALKAR, JAYANT; KATKAM, RAJENDER; ZUO, VINCENT
To: AVAVA, INC.
Reel/Frame 073478/0017 →