LIGHT PATTERNABLE SURFACE MODIFICATION
Materials and methods for modifying surfaces in order to change surface energy are provided. These surface properties cause the surface to become more hydrophobic or oleophobic after light exposure. The ability to change surface energy upon exposure allows these materials to be patterned and enables a variety of uses, notably for use on semiconductor substrates in photolithography.
1 . A polymer comprising at least first and second recurring monomers different from one another, wherein:
said first monomer comprises a surface modifying group chosen from C 8 to C 36 alkyls, octadecylalcohol, octadecylamine, behenyl alcohol, behenyl amine, tridecyl alcohol, tridecyl amine, lauryl alcohol, lauryl amine, or combinations thereof; and
said second recurring monomer comprises a light sensitizing group chosen from 2-hydroxy-4-methoxybenzophenone, hydroxybenzophenone, aminobenzophenone, 4-benzoylbenzoic acid, 4-(bromomethyl)benzophenone, sodium azide, diazirine, anthracene, compound (I) below, compound (II) below:
or combinations thereof.
2 . The polymer of claim 1 , further comprising a third monomer for enhancing the solubility of said polymer, wherein said third monomer is chosen from methyl methacrylate, styrene, methyl methacrylate, methylstyrene, 4-tert-butylstyrene, n-butyl methacrylate, benzyl methacrylate, tert-butyl methacrylate, and combinations thereof.
3 . The polymer of claim 1 , wherein said first monomer is present in said polymer in an amount of from about 75 mol % to about 95 mol % and said second monomer is present in said polymer in an amount of from about 5 mol % to about 40 mol %, based on said total moles of said polymer taken as 100%.
4 . The polymer of claim 1 , wherein said polymer is chosen from—
5 . The method of claim 1 , wherein said first and/or said second monomer comprise a base monomer chosen from 4-chloromethylstyrene, 4-azido methylstyrene, glycidyl methacrylate, methacryloyloxyethyl isocyanate, azidopropyl methacrylate, methacryloyl chloride, or combinations thereof, and wherein said base monomer has been functionalized with said surface modifying group and/or said light sensitizing group.
6 . The polymer of claim 1 , wherein the light sensitizing group is pendant from the polymer backbone.
7 . The polymer of claim 1 , wherein the polymer undergoes a physical and/or chemical change upon exposure to light at a wavelength of about 100 nm to about 700 nm and at a dose of about 100 mJ/cm 2 or greater.
8 . The polymer of claim 7 , wherein said physical and/or chemical change enables the polymer to react or adhere to underlying surfaces made of materials selected from silicon, SiGe, SiO 2 , Si 3 N 4 , SiON, SiCO:H, tetramethyl silate and tetramethyl-cyclotetrasiloxane combinations, aluminum, tungsten, tungsten silicide, gallium arsenide, germanium, tantalum, tantalum nitride, Ti 3 N 4 , hafnium, HfO 2 , ruthenium, indium phosphide, glass, or combinations of the foregoing.