IP Library › Granted Patent US 812,578
Granted Patent S1
US 812,578 · App. 29/572,169 · Granted Mar 13, 2018

Upper chamber for a plasma processing apparatus

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Quick Facts
Patent No.
US 812,578
App. No.
29/572,169
Granted
Mar 13, 2018
Kind
S1
Claims (1)

The ornamental design for an upper chamber for a plasma processing apparatus, as shown and described.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 26, 2016
From: UEMURA, TAKASHI; SATO, KOHEI; TAUCHI, SUSUMU
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 040145/0889 →