IP Library › Granted Patent US 831,085
Granted Patent S1
US 831,085 · App. 29/606,718 · Granted Oct 16, 2018

Substrate processing unit

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Quick Facts
Patent No.
US 831,085
App. No.
29/606,718
Granted
Oct 16, 2018
Kind
S1
Claims (1)

The ornamental design for a substrate processing unit, as shown and described.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 16, 2017
From: SAKKA, YUSAKU; KAWASAKI, HIROMICHI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 043301/0607 →