IP Library › Granted Patent US 836,573
Granted Patent S1
US 836,573 · App. 29/610,998 · Granted Dec 25, 2018

Ring for a plasma processing apparatus

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Quick Facts
Patent No.
US 836,573
App. No.
29/610,998
Granted
Dec 25, 2018
Kind
S1
Claims (1)

The ornamental design for a ring for a plasma processing apparatus, as shown and described.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 15, 2017
From: ICHINO, TAKAMASA; SATO, KOHEI; NAKAMOTO, KAZUNORI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 043599/0899 →