IP Library › Granted Patent US 908,645
Granted Patent S1
US 908,645 · App. 29/703,194 · Granted Jan 26, 2021

Sputtering target for a physical vapor deposition chamber

Inventors: Kirankumar Neelasandra Savandaiah (Karnataka, IN); David Gunther (San Jose, CA); Siew Kit Hoi (Singapore, SG)
Assignee: APPLIED MATERIALS, INC.
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Quick Facts
Patent No.
US 908,645
App. No.
29/703,194
Granted
Jan 26, 2021
Kind
S1
Claims (1)

We claim the ornamental design for a sputtering target for a physical vapor deposition chamber, as shown and described.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 3, 2019
From: SAVANDAIAH, KIRANKUMAR NEELASANDRA; GUNTHER, DAVID
To: APPLIED MATERIALS, INC.
Reel/Frame 051164/0241 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 5, 2019
From: APPLIED MATERIALS SINGAPORE TECHNOLOGY PTE. LTD.
To: APPLIED MATERIALS, INC.
Reel/Frame 050917/0604 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 6, 2019
From: HOI, SIEW KIT
To: APPLIED MATERIALS SINGAPORE TECHNOLOGY PTE. LTD.
Reel/Frame 050294/0566 →