IP Library › Granted Patent US 1,007,449
Granted Patent S1
US 1,007,449 · App. 29/782,632 · Granted Dec 12, 2023

Target profile for a physical vapor deposition chamber target

Inventors: David Gunther (Santa Clara, CA); Kirankumar Neelasandra Savandaiah (Bangalore, IN); Jiao Song (Singapore, SG); Madan Kumar Shimoga Mylarappa (Bengaluru, IN); Yue Cui (Singapore, SG); Nuno Yen-Chu Chen (Singapore, SG); Mengxue Wu (Singapore, SG)
Assignee: APPLIED MATERIALS, INC.
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Quick Facts
Patent No.
US 1,007,449
App. No.
29/782,632
Granted
Dec 12, 2023
Kind
S1
Claims (1)

We claim the ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 15, 2021
From: APPLIED MATERIALS SINGAPORE TECHNOLOGY PTE. LTD.
To: APPLIED MATERIALS, INC.
Reel/Frame 057806/0282 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 13, 2021
From: GUNTHER, DAVID; SAVANDAIAH, KIRANKUMAR NEELASANDRA; SHIMOGA MYLARAPPA, MADAN KUMAR
To: APPLIED MATERIALS, INC.
Reel/Frame 056231/0239 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 13, 2021
From: SONG, JIAO; CUI, YUE; CHEN, NUNO YEN-CHU; WU, MENGXUE
To: APPLIED MATERIALS SINGAPORE TECHNOLOGY PTE. LTD.
Reel/Frame 056231/0406 →