IP Library › Granted Patent US 1,043,964
Granted Patent S1
US 1,043,964 · App. 29/826,077 · Granted Sep 24, 2024

Mask

Inventor: Jonathan Teh Cheng Chang (Harvard, MA)
Assignee: CHINA SURGICAL DRESSINGS CENTER CO., LTD.
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Quick Facts
Patent No.
US 1,043,964
App. No.
29/826,077
Granted
Sep 24, 2024
Kind
S1
Claims (1)

The ornamental design for a mask, as shown and described.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 16, 2022
From: CHANG, JONATHAN TEH CHENG
To: CHINA SURGICAL DRESSINGS CENTER CO., LTD.
Reel/Frame 059024/0066 →