IP Library Patent Application 60325331
Patent Application Provisional
App. No. 60/325,331 · Confirmation No. 2223

Apparatus and method for epitaxial sputter deposition of epilayers with high deposition rate

Inventor: Roman Chistyakov
Provisional Application Expired
⬇ PDF
Code Description Pages PDF
2001-09-27 TRNA Transmittal of New Application 2 View
2001-09-27 SPEC Specification 3 View
2001-09-27 DRW Drawings-only black and white line drawings 1 View
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Quick Facts
App. No.
60/325,331
Filed
2001-09-27