IP Library › Patent Application 60433477
Patent Application Provisional
App. No. 60/433,477 · Confirmation No. 9390

Method and system for magnification and distortion control for layer-to-layer alignment in imprint lithography

Provisional Application Expired
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 Code Description Pages PDF
2002-12-13 TRNA Transmittal of New Application 1 View
2002-12-13 SPEC Specification 3 View
2002-12-13 DRW Drawings-only black and white line drawings 6 View
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Quick Facts
App. No.
60/433,477
Filed
2002-12-13