Patent Assignment
Reel/Frame 013760/0150
Security Interest
Recorded: 2003-02-19
Received: 2003-02-21
Pages: 7
Assignor
MOLECULAR IMPRINTS, INC.
Executed: 2003-01-31
Assignee
VENTURE LENDING & LEASING III, INC.
2010 NORTH FIRST STREET, SAN JOSE, CA, 95131, UNITED STATES
Covered Properties
(19)
Method and system for magnification and distortion control for layer-to-layer alignment in imprint lithography
Application:
60/433,477 →
Method for Determining Characteristics of Substrate Employing Fluid Geometries
Application:
10/318,365 →
Method of Reducing Pattern Distortions During Imprint Lithography Processes
Application:
10/293,223 →
Chucking System for Modulating Shapes of Substrates
Application:
10/293,224 →
Methods of Inspecting a Lithography Template
Application:
10/293,919 →
Method of forming a layer on a substrate to facilitate fabrication of metrology standards
Application:
10/264,926 →
Method to Arrange Features on a Substrate to Replicate Features Having Minimal Dimensional Variability
Application:
10/264,960 →
Functional Patterning Material for Imprint Lithography Processes
Application:
10/235,314 →
Method for Fabricating Bulbous-Shaped Vias
Application:
10/227,105 →
Alignment Systems for Imprint Lithography
Application:
10/210,894 →
Scatterometry Alignment for Imprint Lithography
Application:
10/210,785 →
Alignment Methods for Imprint Lithography
Application:
10/210,780 →
Formation of Discontinuous Films During an Imprint Lithography Process
Application:
10/194,411 →
Step and Repeat Imprint Lithography Systems
Application:
10/194,414 →
Method for Imprint Lithography Using an Electric Field
Application:
10/194,410 →
Step and Repeat Imprint Lithography Processes
Application:
10/194,991 →
System and Method for Dispensing Liquids
Application:
10/191,749 →
Method and apparatus for whole wafer planarization using optical flats and light curable liquids
Application:
60/394,458 →
Methods of Manufacturing a Lithography Template
Application:
10/136,188 →