IP Library › Patent Application 60491607
Patent Application Provisional Small
App. No. 60/491,607 · Confirmation No. 9593

Process sequence for photoresist stripping and cleaning of photomasks for IC manufacturing

Provisional Application Expired
⬇ PDF
 Code Description Pages PDF
2003-07-31 TRNA Transmittal of New Application 1 View
2003-07-31 SPEC Specification 8 View
2003-07-31 CLM Claims 2 View
2003-07-31 ABST Abstract 1 View
2003-07-31 DRW Drawings-only black and white line drawings 3 View
2003-07-31 WFEE Fee Worksheet (SB06) 1 View
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Quick Facts
App. No.
60/491,607
Filed
2003-07-31