IP Library › Patent Application 60818966
Patent Application Provisional Small
App. No. 60/818,966 · Confirmation No. 5382

Plasma deposition apparatus and method for making polycrystalline silicon

Provisional Application Expired
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 Code Description Pages PDF
2006-07-07 TRNA Transmittal of New Application 2 View
2006-07-07 SPEC Specification 16 View
2006-07-07 CLM Claims 6 View
2006-07-07 ABST Abstract 1 View
2006-07-07 DRW Drawings-only black and white line drawings 5 View
2006-07-07 WFEE Fee Worksheet (SB06) 1 View
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Quick Facts
App. No.
60/818,966
Filed
2006-07-07