IP Library Patent Application 60839897
Patent Application Provisional
App. No. 60/839,897 · Confirmation No. 4686

Plasma composition for selective high-k etch

Provisional Application Expired
⬇ PDF
Code Description Pages PDF
2006-08-23 TRNA Transmittal of New Application 3 View
2006-08-23 SPEC Specification 14 View
2006-08-23 CLM Claims 5 View
2006-08-23 ABST Abstract 1 View
2006-08-23 DRW Drawings-only black and white line drawings 4 View
2006-08-23 WFEE Fee Worksheet (SB06) 1 View
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this application's details
Quick Facts
App. No.
60/839,897
Filed
2006-08-23