IP Library › Patent Application 61808160
Patent Application Provisional
App. No. 61/808,160 · Confirmation No. 5835

POST EXPOSURE BAKE REMOVAL FOR DUV PHOTORESIST PROCESS

Inventors: XIANZHONG ZENG, HAI SUN
Provisional Application Expired
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 Code Description Pages PDF
2013-05-07 APP.FILE.REC Filing Receipt 3 View
2013-04-03 TR.PROV Provisional Cover Sheet (SB16) 3 View
2013-04-03 ABST Abstract 1 View
2013-04-03 SPEC Specification 3 View
2013-04-03 WFEE Fee Worksheet (SB06) 2 View
2013-04-03 N417 Electronic Filing System Acknowledgment Receipt 2 View
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Quick Facts
App. No.
61/808,160
Filed
2013-04-03