IP Library › Patent Application 63178911
Patent Application Provisional
App. No. 63/178,911 · Confirmation No. 1364

HIGH QUANTUM EFFICIENCY DRY RESIST FOR LOW EXPOSURE DOSE OF EUV RADIATION

Applicant: ENTEGRIS, INC.
Provisional Application Expired
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 Code Description Pages PDF
2021-06-28 APP.FILE.REC Filing Receipt 3 View
2021-04-23 PA.. Power of Attorney 1 View
2021-04-23 ADS Application Data Sheet 9 View
2021-04-23 DRW.NONBW Drawings-other than black and white line drawings 6 View
2021-04-23 SPEC Specification 23 View
2021-04-23 CLM Claims 5 View
2021-04-23 ABST Abstract 1 View
2021-04-23 WFEE Fee Worksheet (SB06) 2 View
2021-04-23 N417 Electronic Filing System Acknowledgment Receipt 3 View
2021-04-23 TR.PROV Provisional Cover Sheet (SB16) 5 View
2021-04-23 SCORE Placeholder sheet indicating presence of supplemental content in Supplemental Complex Repository for Examiners(SCORE) 1 View
2021-04-23 DRW.SUPP Drawings-black and white line and/or other drawings — View
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Quick Facts
App. No.
63/178,911
Filed
2021-04-23