IP Library › Patent Application 63386478
Patent Application Provisional
App. No. 63/386,478 · Confirmation No. 2853

ETCH-FREE PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS

Applicant: Illumina, Inc.
Provisional Application Expired
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 Code Description Pages PDF
2023-11-21 APP.FILE.REC Filing Receipt 3 View
2023-11-17 R3.73 Assignee showing of ownership per 37 CFR 3.73 3 View
2023-11-17 R46C.REQ Request under 37CFR1.46(c) to correct, update, change applicant 2 View
2023-11-17 N417 Electronic Filing System Acknowledgment Receipt 2 View
2023-11-17 LET. Miscellaneous Incoming Letter 27 View
2023-11-17 ADS Application Data Sheet 1 View
2023-01-17 APP.FILE.REC Filing Receipt 3 View
2023-01-17 R48.REQ.G Acceptance of Request under Rule 48 to correct inventorship or name 1 View
2023-01-17 APP.FILE.REC Filing Receipt 3 View
2022-12-09 TRAN.LET Transmittal Letter — View
2022-12-09 PA.. Power of Attorney 2 View
2022-12-09 N417 Electronic Filing System Acknowledgment Receipt 3 View
2022-12-09 R48.REQ Request under Rule 48 correcting inventorship 3 View
2022-12-09 ADS Application Data Sheet 3 View
2022-12-09 N417.PYMT Electronic Fee Payment 2 View
2022-12-09 TRAN.LET Transmittal Letter 1 View
2022-12-08 CRFD Sequence Listing in Computer Readable Format is Defective — View
2022-12-08 CRFD Sequence Listing in Computer Readable Format is Defective 8 View
2022-12-07 SPEC Specification — View
2022-12-07 N417.PYMT Electronic Fee Payment 2 View
2022-12-07 N417 Electronic Filing System Acknowledgment Receipt 3 View
2022-12-07 ADS Application Data Sheet 10 View
2022-12-07 SPEC Specification 43 View
2022-12-07 CLM Claims 6 View
2022-12-07 ABST Abstract 1 View
2022-12-07 DRW Drawings-only black and white line drawings 6 View
2022-12-07 SEQ.XML Sequence Listing (XML File) 1 View
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Quick Facts
App. No.
63/386,478
Filed
2022-12-07