IP Library › Patent Application 63510819
Patent Application Provisional
App. No. 63/510,819 · Confirmation No. 7234

PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS

Applicant: Illumina, Inc.
Provisional Application Expired
⬇ PDF
 Code Description Pages PDF
2023-11-29 APP.FILE.REC Filing Receipt 3 View
2023-11-27 R3.73 Assignee showing of ownership per 37 CFR 3.73 3 View
2023-11-27 N417 Electronic Filing System Acknowledgment Receipt 2 View
2023-11-27 ADS Application Data Sheet 1 View
2023-11-27 R46C.REQ Request under 37CFR1.46(c) to correct, update, change applicant 2 View
2023-11-27 CFILE Request for Corrected Filing Receipt 1 View
2023-07-12 APP.FILE.REC Filing Receipt 3 View
2023-07-12 APP.FILE.REC Filing Receipt 3 View
2023-06-30 CRFE Sequence Listing in Computer Readable Format, No errors found — View
2023-06-30 CRFE Sequence Listing in Computer Readable Format, No errors found 8 View
2023-06-28 LET. Miscellaneous Incoming Letter — View
2023-06-28 LET. Miscellaneous Incoming Letter — View
2023-06-28 SPEC Specification — View
2023-06-28 ADS Application Data Sheet 9 View
2023-06-28 PA.. Power of Attorney 1 View
2023-06-28 PA.. Power of Attorney 1 View
2023-06-28 PA.. Power of Attorney 1 View
2023-06-28 PA.. Power of Attorney 1 View
2023-06-28 DRW Drawings-only black and white line drawings 10 View
2023-06-28 N417 Electronic Filing System Acknowledgment Receipt 4 View
2023-06-28 SPEC Specification 46 View
2023-06-28 CLM Claims 8 View
2023-06-28 ABST Abstract 1 View
2023-06-28 N417.PYMT Electronic Fee Payment 2 View
2023-06-28 SEQ.XML Sequence Listing (XML File) 1 View
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this application's details
Quick Facts
App. No.
63/510,819
Filed
2023-06-28