IP Library Granted Patent US 6,930,021
Granted Patent B2
US 6,930,021 · App. 10/790,219 · Granted Aug 16, 2005

Mask and method of manufacturing the same, electro-luminescence device and method of manufacturing the same, and electronic instrument

Assignee: Seiko Epson Corporation
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Quick Facts
Patent No.
US 6,930,021
App. No.
10/790,219
Granted
Aug 16, 2005
Kind
B2
Abstract

A method of manufacturing a mask includes: attaching a second substrate having a plurality of penetrating holes to a first substrate having an opening. The second substrate is attached such that the penetrating holes are positioned within the opening. A groove is formed on a surface of the first substrate facing the second substrate. The groove is utilized to form a flow path between the first and second substrates.

Claims (90)

1. A method of manufacturing a mask comprising:

attaching to a frame having an opening a screen plate having a plurality of penetrating holes arranged to form a mask pattern such that the penetrating holes are positioned within the opening, the penetrating holes set to perpendicularly connect holes formed in opposite surfaces of the screen plate;

forming a groove on at least one of a surface of the frame facing the screen plate and a surface of the screen plate facing the frame; and

utilizing the groove to form a flow path between the frame and the screen plate.

2. The manufacturing method of the mask as defined in claim 1 , wherein at least part of the groove is formed around the opening.

3. The manufacturing method of the mask as defined in claim 1 , wherein the frame and the screen plate are joined by anode coupling.

4. The manufacturing method of the mask as defined in claim 2 , wherein the frame and the screen plate are joined by anode coupling.

5. The manufacturing method of the mask as defined in claim 1 , wherein the steps of forming the screen plate includes:

forming the penetrating holes in a silicon wafer; and

cutting the silicon wafer into a shape corresponding to the screen plate.

6. The manufacturing method of the mask as defined in claim 1 , further comprising:

forming a magnetic film over the screen plate.

7. The manufacturing method of the mask as defined in claim 1 , wherein:

a plurality of the screen plates are attached to the frame;

the frame has a plurality of the openings; and

each of the screen plates is attached to corresponding one of the openings.

8. The manufacturing method of the mask as defined in claim 7 , further comprising:

polishing surfaces of the screen plates attached to the frame to have a uniform height.

9. A mask comprising:

a frame having an opening; and

a screen plate attached to the frame and having a plurality of penetrating holes arranged to form a mask pattern, the penetrating holes set to perpendicularly connect holes formed in opposite surfaces of the screen plate, wherein:

the screen plate is attached to the frame such that the penetrating holes are positioned within the opening;

a groove is formed on at least one of a surface of the frame facing the screen plate and a surface of the screen plate facing the frame; and

the groove is utilized to form a flow path between the frame and the screen plate.

10. The mask as defined in claim 9 , wherein at least part of the groove is formed around the opening.

11. The mask as defined in claim 9 , wherein the frame and the screen plate are joined by anode coupling.

12. The mask as defined in claim 10 , wherein the frame and the screen plate are joined by anode coupling.

13. The mask as defined in claim 9 , wherein a magnetic film is formed over the screen plate.

14. The mask as defined in claim 9 , wherein:

a plurality of the openings are formed in the frame;

a plurality of the screen plates are attached to the frame; and

each of the screen plates is attached to corresponding one of the openings.

15. The mask as defined in claim 14 , wherein surfaces of the screen plates attached to the frame are polished to have a uniform height.

16. A method of manufacturing an electro-luminescence device comprising:

forming a film of a light emitting material using the mask as defined in claim 9 ; and

cooling the mask by causing a fluid to flow through the flow path of the mask, in the step of forming a film of a light emitting material.

17. A method of manufacturing an electro-luminescence device comprising:

forming a film of a light emitting material using the mask as defined in claim 10 ; and

cooling the mask by causing a fluid to flow through the flow path of the mask, in the step of forming a film of a light emitting material.

18. A method of manufacturing an electro-luminescence device comprising:

forming a film of a light emitting material using the mask as defined in claim 11 ; and

cooling the mask by causing a fluid to flow through the flow path of the mask, in the step of forming a film of a light emitting material.

19. A method of manufacturing an electro-luminescence device comprising:

forming a film of a light emitting material using the mask as defined in claim 12 ; and

cooling the mask by causing a fluid to flow through the flow path of the mask, in the step of forming a film of a light emitting material.

20. A method of manufacturing a mask comprising:

attaching to a frame having an opening a screen plate having a plurality of penetrating holes arranged to form a mask pattern such that the penetrating holes are positioned within the opening, the penetrating holes set to be tapered;

forming a groove on at least one of a surface of the frame facing the screen plate and a surface of the screen plate facing the frame; and

utilizing the groove to form a flow path between the frame and the screen plate.

21. The manufacturing method of the mask as defined in claim 20 , wherein at least part of the groove is formed around the opening.

22. The manufacturing method of the mask as defined in claim 20 , wherein the frame and the screen plate are joined by anode coupling.

23. The manufacturing method of the mask as defined in claim 21 , wherein the frame and the screen plate are joined by anode coupling.

24. The manufacturing method of the mask as defined in claim 20 , wherein the steps of forming the screen plate includes:

forming the penetrating holes in a silicon wafer; and

cutting the silicon wafer into a shape corresponding to the screen plate.

25. The manufacturing method of the mask as defined in claim 20 , further comprising:

forming a magnetic film over the screen plate.

26. The manufacturing method of the mask as defined in claim 20 , wherein:

a plurality of the screen plates are attached to the frame;

the frame has a plurality of the openings; and

each of the screen plates is attached to corresponding one of the openings.

27. The manufacturing method of the mask as defined in claim 26 , further comprising:

polishing surfaces of the screen plates attached to the frame to have a uniform height.

28. A mask comprising:

a frame having an opening; and

a screen plate attached to the frame and having a plurality of penetrating holes arranged to form a mask pattern, the penetrating holes set to be tapered, wherein:

the screen plate is attached to the frame such that the penetrating holes are positioned within the opening;

a groove is formed on at least one of a surface of the frame facing the screen plate and a surface of the screen plate facing the frame; and

the groove is utilized to form a flow path between the frame and the screen plate.

29. The mask as defined in claim 28 , wherein at least part of the groove is formed around the opening.

30. The mask as defined in claim 28 , wherein the frame and the screen plate are joined by anode coupling.

31. The mask as defined in claim 29 , wherein the frame and the screen plate are joined by anode coupling.

32. The mask as defined in claim 28 , wherein a magnetic film is formed over the screen plate.

33. The mask as defined in claim 28 , wherein:

a plurality of the openings are formed in the frame;

a plurality of the screen plates are attached to the frame; and

each of the screen plates is attached to corresponding one of the openings.

34. The mask as defined in claim 33 , wherein surfaces of the screen plates attached to the frame are polished to have a uniform height.

35. A method of manufacturing an electro-luminescence device comprising:

forming a film of a light emitting material using the mask as defined in claim 28 ; and

cooling the mask by causing a fluid to flow through the flow path of the mask, in the step of forming a film of a light emitting material.

36. A method of manufacturing an electro-luminescence device comprising:

forming a film of a light emitting material using the mask as defined in claim 29 ; and

cooling the mask by causing a fluid to flow through the flow path of the mask, in the step of forming a film of a light emitting material.

37. A method of manufacturing an electro-luminescence device comprising:

forming a film of a light emitting material using the mask as defined in claim 30 ; and

cooling the mask by causing a fluid to flow through the flow path of the mask, in the step of forming a film of a light emitting material.

38. A method of manufacturing an electro-luminescence device comprising:

forming a film of a light emitting material using the mask as defined in claim 31 ; and

cooling the mask by causing a fluid to flow through the flow path of the mask, in the step of forming a film of a light emitting material.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 30, 2013
From: SEIKO EPSON CORPORATION
To: INTELLECTUAL KEYSTONE TECHNOLOGY LLC
Reel/Frame 030319/0722 →
Priority Claims (1)
JP 2001-292041 · Sep 25, 2001 · national
Continuity (2)
Continuation 1024736000 · Sep 20, 2002
Related Publication 20040166652A1 · Aug 26, 2004