IP Library Granted Patent US 7,205,778
Granted Patent B2
US 7,205,778 · App. 11/350,726 · Granted Apr 17, 2007

Electrostatic capacitance detecting device

Assignee: Seiko Epson Corporation
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Quick Facts
Patent No.
US 7,205,778
App. No.
11/350,726
Granted
Apr 17, 2007
Kind
B2
Abstract

The invention provides an electrostatic capacitance detection device. The electrostatic capacitance detection device can be formed of M individual power supply lines, N individual output lines, arranged in a matrix of M rows×N columns, and electrostatic capacitance detection elements provided on the crossing points of the individual power supply lines and the individual output lines, each of the electrostatic capacitance detection elements is formed of a signal detection element and a signal amplification element, the signal detection element is formed of a capacitance detecting electrode and a capacitance detecting dielectric layer, the signal amplification element formed of a metal-insulator-semiconductor (MIS) type thin film semiconductor device for signal amplification, including a gate electrode, a gate insulating layer and a semiconductor layer.

Claims (27)

1. An electrostatic capacitance detection device for reading surface contours of an object by detecting an electrostatic capacitance, which changes according to a distance with the object, comprising:

M individual power supply lines and N individual output lines, arranged in a matrix of M rows×N columns, and electrostatic capacitance detection elements provided on crossing points of the individual power supply lines and the individual output lines;

each of the electrostatic capacitance detection elements being formed of a signal detection element and a signal amplification element,

the signal detection element being formed of a capacitance detecting electrode, a capacitance detecting dielectric layer and a reference capacitor,

the reference capacitor being formed of a reference capacitor first electrode, a reference capacitor dielectric layer and a reference capacitor second electrode,

the signal amplification element being formed of a MIS type thin film semiconductor device for signal amplification, including a gate electrode, a gate insulating layer and a semiconductor layer, and

a drain region of the MIS type thin film semiconductor device for signal amplification being electrically coupled to the individual power supply lines and the reference capacitor first electrode, and the gate electrode of the MIS type thin film semiconductor device for signal amplification being coupled to the capacitance detecting electrode and the reference capacitor second electrode.

2. The electrostatic capacitance detection device according to claim 1 , the reference capacitor dielectric layer and the gate insulating layer of the MIS type thin film semiconductor device for signal amplification being formed with a same material on a same layer.

3. The electrostatic capacitance detection device according to claim 1 , the reference capacitor first electrode and a drain region of the semiconductor film being formed with a same material on a same layer.

4. The electrostatic capacitance detection device according to claim 1 , the reference capacitor second electrode and the gate electrode being formed with a same material on a same layer.

5. The electrostatic capacitance detection device according to claim 1 , the capacitance detecting dielectric layer being located on an uppermost surface of the electrostatic capacitance detection device.

6. An electrostatic capacitance detection device, comprising:

a plurality of power supply lines;

a plurality of output lines; and

a plurality of electrostatic capacitance detection elements arranged corresponding to intersections of the plurality of power supply lines and the plurality of output lines, each of the electrostatic capacitance detection elements including:

a signal detection element, the signal detection element including:

a capacitance detecting electrode;

a capacitance detecting dielectric layer; and

a reference capacitor, the reference capacitor including:

a first electrode;

a dielectric layer; and

a second electrode; and

a signal amplification element, the signal amplification element including:

a thin film semiconductor device, the thin film semiconductor device including:

a source electrode;

a drain electrode, one of the source electrode and the drain electrode being electrically coupled to a corresponding power supply line of the plurality of power supply lines and the first electrode; and

a gate electrode being electrically coupled to the capacitance detecting electrode and the second electrode.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 22, 2018
From: SEIKO EPSON CORPORATION
To: 138 EAST LCD ADVANCEMENTS LIMITED
Reel/Frame 047567/0006 →
Priority Claims (2)
JP 2003-112793 · Apr 17, 2003 · national
JP 2004-50148 · Feb 25, 2004 · national
Continuity (2)
Division 1082537700 · Apr 16, 2004
Related Publication 20060125490A1 · Jun 15, 2006