Compound for optical materials and methods of fabrication
View Patent ↗A polycyclic or monocyclic perfluorovinyl compound comprising at least one structural unit selected from the group consisting of formula I and formula II wherein M is independently at each occurrence a metal selected from group 14 of the periodic table of the elements; and R is independently at each occurrence a bond, a hydrogen, an aliphatic group, a cycloaliphatic group, or an aromatic group. The polycyclic or monocyclic compound comprises at least two perfluorovinyl groups. A method for making an optical film of the disclosed compound, an electro-optical device comprising a polymer fabricated from the disclosed compound and a polymer fabricated from the disclosed compound are also provided.
1. A method of forming an optical film, said method comprising:
(a) providing a blend of monomer A and monomer B, said monomer A comprising a polycyclic or monocyclic perfluorovinyl compound comprising at least one structural unit selected from the group consisting of formula I and formula II
wherein M is independently at each occurrence a metal selected from group 14 of the periodic table of the elements,
R is independently at each occurrence a bond, a hydrogen, an aliphatic group, a cycloaliphatic group, or an aromatic group; said polycyclic or monocyclic compound comprising at least two perfluorovinyl groups,
said monomer B being an organic compound comprising at least two CF 2 ═CF— units;
(b) mixing said blend with a photo-initiator and a photo-curable monomer C, wherein said photo-curable monomer C comprises at least one of an acrylate, an epoxy, a polyimide, a silicone, a vinyl compound, a carbonate, and a diene, to yield a mixed blend;
(c) partially polymerizing at least one of the blend and the mixed blend;
(d) depositing said mixed blend on a substrate to form a film;
(e) selectively exposing said film to radiation to at least partially polymerize monomer C; and
(f) curing said film.
2. The method according to claim 1 , wherein said M comprises at least one of silicon and germanium.
3. The method according to claim 1 wherein said polycyclic or monocyclic perfluorovinyl compound comprises a silicon-oxygen network.
4. The method according to claim 3 wherein said silicon-oxygen network comprises an oligomeric silsesquioxane.
5. The method according to claim 4 , wherein said oligomeric silsesquioxane comprises a polyhedral oligosilsesquioxane.
6. The method according to claim 5 , wherein said polyhedral oligomeric silsesquioxane comprises an octahedral structure.
7. The method according to claim 1 , wherein said monomer B further comprises CF 2 ═CF—X m —R—X m —CF═CF 2 wherein
X is independently at each occurrence a bond, an oxygen linkage, an amine linkage, a sulfur linkage, a silicon-containing linkage, an aliphatic group, a cycloaliphatic group, or an aromatic group,
m is independently at each occurrence an integer from 0 to about 100, and
R is a bond, an aliphatic group, a cycloaliphatic group, or an aromatic group.
8. The method according to claim 7 wherein X comprises at least one O, N, S, Si, —CH 2 —, —CF 2 —, —CR 2 —, alkyl group, alkoxy group, partially halogenated aliphatic group, or fully halogenated aliphatic group, wherein R is a bond, an aliphatic group, a cycloaliphatic group, or an aromatic group.
9. The method according to claim 1 , wherein (c) comprises the partial polymerization of the blend of monomers A and B, said partial polymerizing being carried out prior to formation of the mixed blend.
10. The method according to claim 1 , wherein said curing in (f) is carried out by at least one of heat radiation, light exposure and combinations thereof.
11. The method according to claim 1 , wherein (c) comprises heating said blend for between about 2 minutes and about 60 minutes at a temperature between about 100° C. and about 200° C.
12. The method according to claim 1 , wherein (e) further comprises diffusing monomer C from an unexposed area into an exposed area of said film after selectively exposing said film to radiation.
13. The method according to claim 12 wherein selectively exposing and diffusing are performed to generate a desired contrast in index of refraction between exposed and unexposed areas of said film.
14. The method according to claim 1 , wherein said mixed blend has a viscosity of about 10 cSt to about 10,000 cSt.
15. The method according to claim 1 , wherein said mixed blend is deposited on a substrate using a technique comprising at least one of spin-coating, doctor blading, dip-coating, casting, extrusion and combinations thereof.
16. The method according to claim 1 , wherein step (e) further comprises exposing said film to radiation using a photo-mask.
17. The method according to claim 10 , wherein said curing comprises heating to a temperature of about 150° C. to about 300° C.