Solid state image pickup device, method for producing the same, and image pickup system comprising the solid state image pickup device
The present invention inhibits variations in sensitivity of an image pickup element formed in a jointed area in the image pickup element produced using exposure in a joined fashion. The image pickup element 11 has a light receiving area 102 formed on a substrate 101 , an insulation layer 104 deposited on a light receiving area 102 , and a microlens 106 formed on the insulation layer 104 and collecting incident light onto the light receiving area 102 . A pattern 103 L and a pattern 103 R with an optical axis of the microlens 106 as a divisional line by exposure in a joined fashion in different exposure steps are arranged with an optical path for incident light collected by the microlens 106 held therebetween, and are provided so that a clearance from the optical path equals a distance L. The distance L is set to be larger than the alignment accuracy of an exposure device exposing the patterns 103 L and 103 R.
1. A solid state image pickup device comprising:
a light receiving area disposed on a substrate;
a plurality of layers disposed on a substrate;
a light collecting unit disposed above the plurality of layers, wherein
said plurality of layers include a layer having a first pattern formed by exposure in a plurality of steps, and a layer having a second pattern formed by one-shot exposure, the first and second patterns have openings corresponding to said light receiving area, the opening of the second pattern is larger than the opening of the first pattern, light collecting unit and the opening of the second pattern define an optical path of light incident in said light receiving area, first pattern is arranged in a position except for the optical path.
2. The solid state image pickup device according to claim 1 , wherein the first pattern is formed between said second pattern and said light receiving area.
3. The solid state image pickup device according to claim 2 , wherein a first insulation layer is formed between said light receiving area and the first pattern, and a second insulation layer having a refraction index smaller than said first insulation layer is formed between the first pattern and the second pattern.
4. The solid state image pickup device according to claim 1 , wherein a further light collecting unit is formed between said light collecting unit and said light receiving area.
5. An image pickup system comprising:
a processing unit comprising the solid state image pickup device according to any one of claims 1 - 4 , and processing means for processing output signals from said solid state image pickup device and generating image data;
a recording unit storing said image data;
an optical unit forming a subject image on a screen surface of said solid state image pickup device; and
a control unit controlling said processing unit, said recording unit and said optical unit.