Method of fabricating a liquid crystal display device

1. A method of fabricating a liquid crystal display device, comprising:

forming first and second conductive layers on a substrate;

forming a photo-resist pattern on the second conductive layer;

patterning the second conductive layer and the first conductive layer using the photo-resist pattern as a mask, wherein an edge of the patterned first conductive layer is located inside an edge of the patterned second conductive layer;

ashing the photo-resist pattern so as to reduce the photo-resist pattern remaining on the second conductive layer after patterning the second conductive layer and the first conductive layer;

etching at least one lateral part of the patterned second conductive layer using the ashed photo-resist pattern as a mask; and

removing the remaining photo-resist pattern,

wherein patterning the second conductive layer and the first conductive layer includes;

etching the second conductive layer using a first wet etching process; and

etching the first conductive layer using a second wet etching process.

2. The method according to claim 1 , wherein the at least one lateral part of the patterned second conductive layer is etched using a dry etching process.

3. The method according to claim 1 , wherein etching the at least one lateral part of the patterned second conductive layer includes:

etching the at least one lateral part so that an edge of the patterned second conductive layer is located inside an edge of the patterned first conductive layer.