Optical integrated device
The present invention provides an optical device integrating an active device with a passive device without any butt joint structure between two devices. The optical integrated device of the invention includes a GaAs substrate, first and second cladding layers, and an active layer sandwiched by the first and second cladding layers. These layers are disposed on the GaAs substrate. The GaAs substrate provides a first region and a second region. The active layer comprises of the first active layer disposed on the first region and the second active layer disposed on the second region of the GaAs substrate. The first active layer has a quantum well structure whose band-gap energy smaller than 1.3 eV, while the second active layer has a quantum well structure whose band-gap energy is greater than that of the first active layer.
1. An optical integrated device, comprising:
a GaAs substrate having a first region and a second region, said second region directly contacting said first region, said first and second regions being arranged along a prescribed axis in this order;
a first cladding layer commonly disposed on said first region and said second region;
an active layer disposed on said first cladding layer, said active layer including a first quantum well structure disposed in said first region and a second quantum well structure disposed in said second region and having a thickness substantially equal to a thickness of said first quantum well structure, said second quantum well structure including at least one well layer and two barrier layers puffing said well layer therebetween; and
a second cladding layer disposed on said active layer,
wherein said first quantum well structure has a band-gap energy smaller than 1.3 eV and said second quantum well structure has a band-gap energy greater than said band-gap energy of said first quantum well structure, and
wherein an interface between said well layer and one of said barrier layers of said second quantum well structure is relaxed.
2. The optical integrated device according to claim 1 ,
wherein said active layer includes a group III-V compound semiconductor material containing at least nitrogen (N).
3. The optical integrated device according to claim 2 ,
wherein said active layer further includes at least one of antimony (Sb) and phosphorous (P).
4. The optical integrated device according to claim 1 ,
wherein said active layer includes a group III-V compound semiconductor material containing gallium (Ga), arsenic (As) and nitrogen (N).
5. The optical integrated device according to claim 4 ,
wherein said active layer further includes at least one of antimony (Sb) and phosphorous (P).
6. The optical integrated device according to claim 4 ,
wherein said semiconductor material in said active layer is one of GaNAs, GaInNAs, GaNAsSb, GaNAsP, GaNAsSbP, GaInNAsSb, GaInNAsP, and GaInNAsSbP.
7. The optical integrated device according to claim 1 ,
wherein said first cladding layer is made of at least one of AlGaInP, GaInP, GaInAsP and AlGaAs, and said second cladding layer is made of at least one of AlGaInP, GaInP, GaInAsP and AlGaAs.
8. The optical integrated device according to claim 1 ,
further comprising a current blocking layer,
wherein said second cladding layer includes a ridge buried with said current blocking layer.
9. The optical integrated device according to claim 8 ,
wherein said current blocking layer is made of at least one of AlGaInP, GaInP, GaInAsP and AlGaAs.
10. The optical integrated device according to claim 1 ,
further comprising a current blocking layer,
wherein said first cladding layer, said active layer and said second cladding layer form a mesa buried with said current blocking layer.
11. The optical integrated device according to claim 10 ,
wherein said current blocking layer is made of at least one of AlGaInP, GaInP, GaInAsP and AlGaAs.
12. The optical integrated device according to claim 1 ,
further comprising a first optical confinement layer sandwiched between said first cladding layer and said active layer and a second optical confinement layer sandwiched between said active layer and said second cladding layer.