Variable mask device for crystallizing silicon layer
Disclosed are a variable mask device for crystallizing a silicon layer capable of controlling a width and a length of an opening, and a method for crystallizing a silicon using the variable mask device. The variable mask device has a frame with an opening whose width is controlled by an X direction actuator and whose length is controlled by a Y direction actuator. A substrate on which a plurality of unit liquid crystal display panels are formed is provided. A laser beam is aligned through the opening and the silicon layer formed on the substrate is irradiated with the laser beam, thereby crystallizing the silicon layer. The substrate is moved in an X direction by scanning distance and the silicon layer is irradiated until the silicon layer is entirely crystallized.
1. A variable mask device for crystallizing a silicon layer of a liquid crystal display (LCD) panel, comprising:
a frame defining an opening, the opening disposed between the silicon layer of the LCD panel and a source of a laser beam;
actuators for controlling a dimension of the opening; and
actuators controlling units to connect the frame with the actuators, to control respective the actuators.
2. The device of claim 1 , wherein the frame has a clamp shape.
3. The device of claim 1 , wherein the actuator comprises an X direction actuator and a Y direction actuator.
4. The device of claim 1 , wherein the opening has a rectangular shape.
5. The device of claim 1 , wherein a width of the opening, which is controlled by the actuator, is at most 15 μm.
6. The device of claim 1 , wherein a length of the opening, which is controlled by the actuator, is longer than one side of a unit liquid crystal display panel formed on a substrate.
7. The device of claim 1 , wherein the actuator comprising only a Y direction actuator.