Integrated laser-diffractive lens device
View Patent ↗A semiconductor laser device includes an edge-emitting laser monolithically integrated with a diffractive lens formed on the chip surface to emit a focalized or collimated beam in a direction perpendicular to the surface. An upper reflective surface and an angled reflective surface are formed in the chip upper surface. A lower reflective surface is formed in the chip lower surface. The laser, angled reflective surface, upper reflective surface, lower reflective surface and diffractive lens are oriented in relation to one another so that a first portion of the light emitted by the laser impinges directly upon the upper reflective surface, which reflects it onto the angled reflective surface, while a second portion of the light emitted by the laser impinges directly upon the angled reflective surface. The angled reflective surface reflects the light portions onto the lower reflective surface, which in turn reflects them through the diffractive lens.
1. A laser device, comprising:
a semiconductor substrate having an upper surface and a lower surface, the upper surface having formed therein an upper reflective surface, a diffractive lens, and an angled reflective surface, the lower surface having formed therein a lower reflective surface;
an edge-emitting laser formed in the semiconductor substrate for emitting a diverging light beam into the substrate along an emission axis, said emission axis being substantially parallel to the upper reflective surface, substantially parallel to the lower reflective surface, and intersecting the angled reflective surface at a non-zero angle; and
wherein the laser, angled reflective surface, upper reflective surface, lower reflective surface and diffractive lens are oriented in relation to one another for a first portion of the diverging light beam to impinge directly upon the upper reflective surface and a second portion of the diverging light beam to impinge directly upon the angled reflective surface, and wherein the angled reflective surface reflects the impinging first and second portions onto the lower reflective surface, and the lower reflective surface reflects the first and second portions through the diffractive lens.
2. The laser device claimed in claim 1 , wherein the upper surface has a groove formed therein, and the angled reflective surface is a wall of the groove.
3. The laser device claimed in claim 1 , wherein the portion of the substrate between the laser and the angled reflective surface is a free-propagation region through which the light beam propagates.
4. The laser device claimed in claim 1 , wherein the substrate is doped InP.
5. The laser device claimed in claim 1 , wherein n and p electrical contacts of the laser are disposed on the upper surface of the semiconductor substrate.
6. A method for making a laser device, comprising:
forming an upper reflective surface in an upper surface of a semiconductor substrate;
forming a diffractive lens in an upper surface of a semiconductor substrate;
forming an angled reflective surface an upper surface of a semiconductor substrate;
forming a lower reflective surface in a lower surface of the semiconductor substrate;
forming an edge-emitting laser formed in the semiconductor substrate, the laser oriented to emit a diverging light beam into the substrate along an emission axis substantially parallel to the upper reflective surface, substantially parallel to the lower reflective surface, and intersecting the angled reflective surface at a non-zero angle; and
wherein the laser, angled reflective surface, upper reflective surface, lower reflective surface and diffractive lens are formed in orientations in relation to one another for a first portion of the diverging light beam to impinge directly upon the upper reflective surface and a second portion of the diverging light beam to impinge directly upon the angled reflective surface, and wherein the angled reflective surface reflects the impinging first and second portions onto the lower reflective surface, and the lower reflective surface reflects the first and second portions through the diffractive lens.
7. The method claimed in claim 6 , further comprising the steps of selecting a beam aperture and orienting the laser, the angled reflective surface, upper reflective surface, lower reflective surface and diffractive lens in relation to each other for the first and second portions to merge as they pass through the diffractive lens into a beam having the selected aperture.
8. The method claimed in claim 6 , wherein the step of forming an angled reflective surface an upper surface of a semiconductor substrate comprises forming a groove in the upper surface of the semiconductor substrate.
9. The method claimed in claim 6 , wherein the step of forming a diffractive lens in an upper surface of a semiconductor substrate comprises semiconductor etching.
10. The method claimed in claim 6 , wherein the step of forming an edge-emitting laser comprises forming a p electrical contact and an n electrical contact on the upper surface of the semiconductor substrate.
11. The method claimed in claim 6 , wherein the step of forming an edge-emitting laser comprises forming a multiple-quantum-well active region on the upper surface of the semiconductor substrate.
12. The method claimed in claim 6 , further comprising coating an upper surface of the laser device with an anti-reflective coating.