Verification of radiation beam characteristics
A system to acquire a first image of a radiation field, the radiation field produced by a radiation beam, and to determine a second image based on the first image and based on a reference image of a reference radiation field having substantially homogeneous intensity, the second image representing characteristics of the radiation beam. Some embodiments provide acquisition of a first profile associated with a radiation beam using a radiation detection device, acquisition of a first image of a first radiation field produced by the radiation beam using an imaging device, determination of a map between the first image and the first profile, acquisition a second image of a second radiation field using the imaging device, and determination of a second profile based on the map and the second image.
1. A method comprising:
acquiring a first profile associated with a radiation beam using a scanning ion chamber;
acquiring a first image of a first radiation field produced by the radiation beam using an imaging device;
determining a map between the first image and the first profile;
acquiring a second image of a second radiation field using the imaging device; and
determining a second profile based on the map and the second image.
2. A method according to claim 1 , further comprising:
determining a difference between the first profile and the second profile.
3. A method according to claim 2 , further comprising:
determining that the second radiation field is within a specified tolerance of the first radiation field based on the difference.
4. A medium storing processor-executable process steps, the process steps comprising:
a step to acquire a first profile associated with a radiation beam using a scanning ion chamber;
a step to acquire a first image of a first radiation field produced by the radiation beam using an imaging device;
a step to determine a map between the first image and the first profile;
a step to acquire a second image of a second radiation field using the imaging device; and
a step to determine a second profile based on the map and the second image.
5. A medium according to claim 4 , the process steps further comprising:
a step to determine a difference between the first profile and the second profile.
6. A medium according to claim 5 , the process steps further comprising:
a step to determine that the second radiation field is within a specified tolerance of the first radiation field based on the difference.
7. A device comprising:
a memory storing processor-executable process steps;
a processor in communication with the memory and operative in conjunction with the stored process steps to:
acquire a first profile associated with a radiation beam using a scanning ion chamber;
acquire a first image of a first radiation field produced by the radiation beam using an imaging device;
determine a map between the first image and the first profile;
acquire a second image of a second radiation field using the imaging device; and
determine a second profile based on the map and the second image.
8. A device according to claim 7 , the processor further operative in conjunction with the stored process steps to:
determine a difference between the first profile and the second profile.
9. A device according to claim 8 , the processor further operative in conjunction with the stored process steps to:
determine that the second radiation field is within a specified tolerance of the first radiation field based on the difference.
10. A system comprising:
a linear accelerator configured to emit a radiation beam;
a scanning ion chamber configured to acquire a first profile associated with the radiation beam;
an imaging device configured to acquire a first image of a first radiation field produced by the radiation beam, and to acquire a second image of a second radiation field; and
a processor configured to determine a map between the first image and the first profile, and to determine a second profile based on the map and the second image.
11. A system according to claim 10 , the processor further configured to determine a difference between the first profile and the second profile.
12. A device according to claim 11 , the processor further configured to determine that the second radiation field is within a specified tolerance of the first radiation field based on the difference.