Conformal doping apparatus and method
View Patent ↗A method of doping includes depositing a layer of dopant material on nonplanar and planar features of a substrate. Inert ions are generated from an inert feed gas. The inert ions are extracted towards the substrate where they physically knock the dopant material into both the planar and nonplanar features of the substrate.
1. A method of doping comprising:
depositing a layer of dopant material on nonplanar and planar features of a substrate;
generating inert ions from an inert feed gas; and
extracting the inert ions towards the substrate, the inert ions physically knocking the dopant material into both the planar and nonplanar features of the substrate, wherein the inert ions are extracted towards the substrate at a non-normal angle relative to the planar surface of the substrate.
2. The method of claim 1 wherein the inert feed gas comprises at least one of He, Ne, Ar, Kr and Xe.
3. The method of claim 1 wherein the layer of dopant material is deposited using at least one of B2H6, PH3, AsH3, BF3, PF3 and AsF5.
4. The method of claim 1 wherein a mass of the inert ions is chosen to be similar to a mass of the dopant ions.
5. The method of claim 1 wherein the extracting the inert ions comprises applying a bias voltage to at least one of a platen supporting the substrate and a grating positioned proximate to the platen.
6. The method of claim 1 wherein the extracting the inert ions towards the substrate is performed with a beam-line ion implanter.
7. The method of claim 1 wherein the depositing the layer of dopant material on nonplanar features of the substrate and the extracting the inert ions towards the substrate are performed in different chambers.
8. The method of claim 1 further comprising biasing the substrate with at least one of a DC, pulsed DC, and an AC bias while extracting the inert ions towards the substrate.
9. The method of claim 1 wherein at least one of an amplitude, a repetition rate, and a pulse width is chosen to achieve a desired doping profile of the planar and nonplanar features of the substrate after annealing.
10. The method of claim 1 wherein a thickness of the deposited layer on the planar features is in a range that is between 1-100 times the thickness of the deposited layer on the nonplanar features.
11. The method of claim 1 wherein at least one of a thickness of the layer of dopant material, a density of inert ions generated, a pressure proximate to the substrate, and a voltage applied to at least one of the platen supporting the substrate and a grating is chosen so that the doping profile of the nonplanar features approximately matches a doping profile of planar surfaces.
12. A method of doping comprising:
depositing a layer of dopant material on nonplanar and planar features of a substrate;
generating inert ions from an inert feed gas; and
extracting the inert ions towards the substrate, the inert ions physically knocking the dopant material into both the planar and nonplanar features of the substrate, wherein at least one of a thickness of the layer of dopant material, a density of inert ions generated, a pressure proximate to the substrate, and a voltage applied to at least one of the platen supporting the substrate and a grating is chosen so that the doping profile of the nonplanar features approximately matches a doping profile of planar surfaces.
13. The method of claim 12 wherein the inert feed gas comprises at least one of He, Ne, Ar, Kr and Xe.
14. The method of claim 12 wherein the layer of dopant material is deposited using at least one of B2H6, PH3, AsH3, BF3, PF3 and AsF5.
15. The method of claim 12 wherein a mass of the inert ions is chosen to be similar to a mass of the dopant ions.
16. The method of claim 12 wherein the extracting the inert ions comprises applying a bias voltage to at least one of a platen supporting the substrate and a grating positioned proximate to the platen.
17. The method of claim 12 wherein the extracting the inert ions towards the substrate is performed with a beam-line ion implanter.
18. The method of claim 12 wherein the depositing the layer of dopant material on nonplanar features of the substrate and the extracting the inert ions towards the substrate are performed in different chambers.
19. The method of claim 12 further comprising biasing the substrate with at least one of a DC, pulsed DC, and an AC bias while extracting the inert ions towards the substrate.
20. The method of claim 12 wherein at least one of an amplitude, a repetition rate, and a pulse width is chosen to achieve a desired doping profile of the planar and nonplanar features of the substrate after annealing.
21. The method of claim 13 wherein a thickness of the deposited layer on the planar features is in a range that is between 1-100 times the thickness of the deposited layer on the nonplanar features.