Low refractive index composition comprising fluoropolyether urethane compound
Antireflective films and low refractive index compositions are described. The low refractive index layer comprises the reaction product of a composition comprising at least one free-radically polymerizable material having a high fluorine content, and at least one free-radically polymerizable fluoropolyether urethane material.
1. A composition having a refractive index of less than 1.47 comprising
i) one or more free-radically polymerizable materials, each having a fluorine content of at least about 25 wt-%, and
ii) at least one free-radically polymerizable fluoropolyether urethane material having a fluorine content ranging from about 10 wt-% to about 30 wt-%; wherein ii) has a fluorine content less than i).
2. A composition suitable for use as a low refractive index coating comprising
i) greater than 20 wt-% of one or more free-radically polymerizable materials, each having a fluorine content of at least about 25 wt-%, and
ii) at least one free-radically polymerizable fluoropolyether urethane material having a fluorine content ranging from about 10 wt-% to about 30 wt-%; wherein ii) has a fluorine content less than i).
3. The composition of claim 1 wherein ii) has a fluorine content ranging from about 5 wt-% to about 40 wt-% fluorine.
4. The composition of claim 1 wherein ii) has a fluorine content ranging from about 10 wt-% to about 30 wt-% fluorine.
5. The composition of claim 1 wherein i) is present at a ratio to ii) ranging from about 1:1 to 5:1.
6. The composition of claim 1 wherein the composition comprises about 15 wt-% to about 45 wt-% fluorine.
7. The composition of claim 1 wherein i) is present in the polymerizable composition in an amount ranging from greater than 20 wt-% to 70 wt-% solids of the organic composition.
8. The composition of claim 1 wherein the composition comprises surface modified inorganic nanoparticles.
9. The composition of claim 8 wherein the surface modified inorganic particles comprise silica.
10. The composition of claims 1 wherein the fluoropolyether urethane material comprises a HFPO— moiety.
11. The composition of claim 1 wherein i) comprises at least one free-radically polymerizable monomer, oligomer, polymer and mixtures thereof comprising at least one moiety selected from fluoropolyether, fluoroalkyl, fluoroalkylene, and mixtures thereof.
12. The composition of claim 1 wherein i) is a fluoropolymer.
13. An antireflective film comprising
a low refractive index layer comprising the reaction product of a composition comprising
i) at least one free-radically polymerizable fluoropolymer having a fluorine content of at least about 25 wt-%, and
ii) at least one free-radically polymerizable fluoropolyether urethane material, and ii) has a fluorine content less than i);
a high refractive index layer coupled to the low refractive index layer.
14. The antireflective film of claim 13 wherein the high refractive index layer is a light transmissible substrate.
15. A coating composition comprising i) a fluoropolymer and ii) at least one free-radically polymerizable multifunctional fluoropolyether urethane material comprising a HFPO- moiety in an organic solvent wherein ii) has a fluorine content less than i) and the cured coating composition is repellant to the organic solvent of the coating composition.
16. The coating composition of claim 15 wherein the organic solvent comprises a ketone, ester, alcohol, ether, or mixture thereof.
17. A method of photolithography comprising
coating the composition of claim 15 onto a substrate;
curing a portion of the coating with radiation, and
removing at least a portion of the uncured coating with organic solvent.