Semiconductor device and method for patterning
View Patent ↗In a masking pattern (a) for patterning word and data lines, length is changed between adjacent word lines so as to be shifted from each other at their tips, and furthermore, the tip of each word line is cut obliquely. It is thus possible to prevent the resist pattern from separation and contact of adjacent patterns. Consequently, it is also possible to prevent break failures of patterned lines and short failures between those patterned lines.
1. A semiconductor device comprising:
a first wiring extending in a first direction and coupled to a plurality of first memory cells;
a second wiring extending in the first direction and coupled to a plurality of second memory cells;
a third wiring extending in the first direction and coupled to a plurality of third memory cells;
a fourth wiring extending in the first direction and coupled to a plurality of fourth memory cells;
a first contact provided at one end of the first wiring;
a second contact provided at one end of the second wiring;
a third contact provided at one end of the third wiring; and
a fourth contact provided at one end of the fourth wiring,
wherein the plurality of first to fourth memory cells are formed in a first rectangular region,
wherein the first and fourth contacts are formed in a second region, wherein the second and third contacts are formed in a third region,
wherein the first rectangular region is provided between the second region and the third region,
wherein a first side of the first rectangular region extends in a second direction perpendicular to the first direction, and
wherein a distance between the other end of the second wiring and the first side of the first rectangular region is shorter than a distance between the other end of the third wiring and the first side of the first rectangular region.
2. A semiconductor device according to claim 1 ,
wherein the other end of the second wiring and the other end of the third wiring are formed in a fourth region, and
wherein the fourth region is provided between the first rectangular region and the second region.
3. A semiconductor device according to claim 1 , wherein a distance between the first contact and the other side of the first rectangular region and a distance between the fourth contact and the other side of the second region are same length.
4. A semiconductor device according to claim 1 , further comprising:
a plurality of sense amplifiers coupled to the first to fourth wirings,
wherein the first to fourth wirings are bit lines.
5. A semiconductor device according to claim 1 , further comprising:
a plurality of word drivers coupled to the first to fourth wirings,
wherein the first to fourth wirings are word lines.
6. A semiconductor device according to claim 1 , wherein a distance between the other end of the second wiring and the other end of the third wiring in the first direction is longer than a distance between the second wiring and the third wiring in the second direction.
7. A semiconductor device according to claim 1 , wherein the plurality of first to fourth memory cells are DRAM memory cells.
8. A semiconductor device according to claim 1 , wherein the second and third wirings are adjacent wirings.