IP Library Granted Patent US 7,651,776
Granted Patent B2
US 7,651,776 · App. 10/535,681 · Granted Jan 26, 2010

Curing resin composition cured film and antireflection film

Assignee: Nitto Denko Corporation
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Quick Facts
Patent No.
US 7,651,776
App. No.
10/535,681
Granted
Jan 26, 2010
Kind
B2
Abstract

A curing resin composition which enables formation of an antireflection layer having good antiscratchability and a cured film obtained from such a curing resin composition are disclosed. The curing resin composition contains (A) a siloxane oligomer having an average molecular weight of 500-10000 in terms of ethylene glycol and (B) a fluorine compound having a number-average molecular weight of 5000 or more in terms of polystyrene and having a fluoroalkyl structure and a polysiloxane structure.

Claims (27)

1. A curing resin composition containing

a siloxane oligomer (A) having an average molecular weight of 500 to 10000 in terms of polyethylene glycol and

a fluorine compound (B) having a fluoroalkyl structure and a polysiloxane structure and having a number average molecular weight of 5000 or more in terms of polystyrene,

wherein the fluorine compound contains a hydroxyl group and/or an epoxy group which are reactive with the siloxane oligomer or the polysiloxane structure in the fluorine compound.

2. The curing resin composition according to claim 1 , wherein a fluorine atom content in the curing resin composition is 20 wt % or more.

3. The curing resin composition according to claim 1 , further containing a crosslinking compound selected from the group consisting of melamine resin, acrylic resin, azide and isocyanate.

4. The curing resin composition according to claim 1 , further containing an acid generating agent selected from the group consisting of a p-toluenesulfonic acid, a benzoic acid and a triazine-containing component.

5. A cured film obtained by curing a curing resin composition according to claim 1 .

6. The cured film according to claim 5 , wherein a ratio (Si/F) of a peak intensity of a silicon atom (Si) to a peak intensity of a fluorine atom (F) on a surface of the cured film as measured with an X-ray photoelectron spectroscopic method is in the range of from 0.4 to 2.

7. An antireflection film comprising a hard coat layer formed on one surface of a transparent substrate directly or with another layer interposed there between and an antireflection layer laminated on a surface of the hard coat layer, wherein the antireflection layer is constituted of a cured film according to claim 5 .

8. The antireflection film according to claim 7 , wherein a surface of the hard coat layer has irregularity of protrusions and depressions combined and an antiglareness.

9. An optical element on one surface or both surfaces of which an antireflection film or antireflection films according to claim 7 are provided.

10. An image display to which an antireflection film according to claim 7 is mounted.

11. The curing resin composition according to claim 2 , further containing a crosslinking compound selected from the group consisting of melamine resin, acrylic resin, azide and isocyanate.

12. The curing resin composition according to claim 2 , further containing an acid generating agent selected from the group consisting of p-toluenesulfonic acid, benzoic acid and a triazine-based compound.

13. The curing resin composition according to claim 3 , further containing an acid generating agent selected from the group consisting of p-toluenesulfonic acid, benzoic acid and a triazine-based compound.

14. The curing resin composition according to claim 11 , further containing an acid generating agent selected from the group consisting of p-toluenesulfonic acid, benzoic acid and a triazine-based compound.

15. A curable resin composition comprising:

(A) a siloxane oligomer having an average molecular weight of 500 to 10000 in terms of polyethylene glycol; and

(B) a fluorine compound having a fluoroalkyl structure and a polysiloxane structure and having a number average molecular weight of 5000 or more in terms of polystyrene, wherein a ratio of A/(A+B) by solid weight is 0.05-0.9,

said composition being curable by heat or active light irradiation by reacting the siloxane oligomer and the polysiloxane structure in the fluorine compound,

wherein the fluorine compound contains a hydroxyl group and/or an epoxy group which are reactive with the siloxane oligomer or the polysiloxane structure in the fluorine compound.

16. The curable resin composition according to claim 15 , further comprising a crosslinking agent in an amount of 70 parts or less by weight with respect to the fluorine compound, wherein said crosslinking agent is selected from the group consisting of melamine resin, acrylic resin, azide and isocyanate.

17. A cured film using the curable resin composition of claim 15 , having a cured structure of: (A) the siloxane oligomerglycol and (B) the fluorine compound, said siloxane oligomer and said polysiloxane structure in the fluorine compound being reacted.

18. The cured film according to claim 17 , which has an additional cured structure wherein the fluorine compound contains a hydroxyl group and/or an epoxy group which have reacted the siloxane oligomer or the polysiloxane structure in the fluorine compound.

19. An image display to which the optical element according to claim 9 is mounted.

20. The curing resin composition according to claim 1 , wherein the siloxane oligomer (A) is prepared by polymerizing a hydrolyzable alkoxysilane and a siloxane oligomer.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 19, 2005
From: YOSHIOKA, MASAHIRO; MIYATAKE, MINORU; SHIGEMATSU, TAKAYUKI
To: NITTO DENKO CORPORATION
Reel/Frame 017483/0383 →
Priority Claims (1)
JP 2002-336093 · Nov 20, 2002 · national
Continuity (1)
Related Publication 20060052565A1 · Mar 9, 2006