High performance flexible substrate thin film transistor and method
A high performance thin film transistor includes a flexible substrate, a layer of metal oxide semiconductor material deposited on the flexible substrate, and a layer of self-assembled organic gate dielectric material deposited on the metal oxide semiconductor material. The metal oxide semiconductor material has high carrier mobility and is transparent. An interface is formed between the layer of metal oxide semiconductor material and the layer of organic gate dielectric material that is substantially free of reactions and Fermi level pinning. The polymer materials are not polar and do not give rise to gap state formation and interface scattering.
1. A high performance thin film transistor compatible with a flexible substrate comprising a layer of metal oxide semiconductor material and a layer of organic gate dielectric material deposited on the metal oxide semiconductor material to form an interface between the layer of metal oxide semiconductor material and the layer of organic gate dielectric material, the layer of organic gate dielectric material including a self-assembled monolayer of organic molecules and the self-assembled monolayer of organic molecules including at least one of SiCl 3 (CH 2 ) 21 CH 3 or SiCl 3 (CH 2 ) 12 CHCH 2 .
2. A high performance thin film transistor as claimed in claim 1 wherein the layer of metal oxide semiconductor material includes at least one of ZnO, InZnO, InO, and InGaZnO.
3. A high performance thin film transistor as claimed in claim 1 wherein the layer of organic gate dielectric material includes one of polyvinyl phenol (PVP) and polyimide.
4. A high performance thin film transistor compatible with a flexible substrate comprising a layer of metal oxide semiconductor material and a layer of organic gate dielectric material deposited on the metal oxide semiconductor material to form an interface between the layer of metal oxide semiconductor material and the layer of organic gate dielectric material, the layer of organic gate dielectric material including a self-assembled monolayer of organic molecules, each self-assembled molecule having an inorganic moiety and an organic moiety, the layer of self-assembled molecules being positioned between the layer of metal oxide semiconductor material and the layer of organic gate dielectric material with the inorganic moiety being coupled to the metal oxide semiconductor material and the organic moiety being coupled to the organic gate dielectric material.
5. A high performance thin film transistor as claimed in claim 4 wherein the layer of self-assembled molecules includes a layer of one of a phosphonate-linked anthrancene and Hexamethyldidilizane (HMDS).
6. A high performance thin film transistor as claimed in claim 4 wherein the layer of organic gate dielectric material includes an organic ferroelectric material forming a non-volatile memory.
7. A high performance thin film transistor as claimed in claim 4 wherein the organic ferroelectric material forming the non-volatile memory includes poly(vinylidene fluoride and trifluoroethylene) P(VDF/TrFE).
8. A high performance thin film transistor as claimed in claim 4 wherein the layer of organic gate dielectric material is a compound layer and includes a first layer of self-assembled organic gate dielectric material and a second layer of gate dielectric material.
9. A high performance thin film transistor as claimed in claim 8 wherein the second layer of gate dielectric material in the compound layer includes an organic ferroelectric material forming a non-volatile memory.
10. A method of fabricating a high performance thin film transistor comprising the steps of:
providing a flexible substrate;
depositing a layer of metal oxide semiconductor material on the flexible substrate, the metal oxide semiconductor material having a high carrier mobility;
depositing a layer of self-assembled organic gate dielectric material on the metal oxide semiconductor material and forming an interface between the layer of metal oxide semiconductor material and the layer of organic gate dielectric material, the forming including positioning a layer of self-assembled molecules between the layer of metal oxide semiconductor material and the layer of self-assembled organic gate dielectric material, each self-assembled molecule having an inorganic moiety and an organic moiety, and the layer of self-assembled molecules being assembled with the inorganic moiety coupled to the metal oxide semiconductor material and the organic moiety coupled to the organic gate dielectric material.
11. A method as claimed in claim 10 wherein the step of depositing the layer of self-assembled organic gate dielectric material includes a step of assembling molecules of the organic gate dielectric material one molecular layer at a time.
12. A method as claimed in claim 10 wherein the step of depositing a layer of self-assembled organic gate dielectric material includes forming a non-volatile memory by depositing an organic ferroelectric material.
13. A method as claimed in claim 10 wherein the step of depositing the layer of metal oxide semiconductor material includes depositing at least one of ZnO, InO, InZnO, and InGaZnO.