Substrate with recess portion for microlens, microlens substrate, transmissive screen, rear type projector, and method of manufacturing substrate with recess portion for microlens
A microlens substrate is provided having a plurality of first microlenses and a plurality of second microlenses which are located between the plurality of first microlenses. The second microlenses are smaller than the first microlenses.
1. A method of manufacturing a substrate with a plurality of recess portions for forming microlenses, comprising:
a first recess portions formation step for forming a plurality of first recess portions in the substrate; and
a second recess portions formation step for forming a plurality of second recess portions in the substrate between the first recess portions, the second recess portions having a different size from the first recess portions,
wherein the second recess portions are smaller than the first recess portions; and
after forming a mask on the substrate and forming a plurality of first openings in the mask, the first recess portions are formed in the substrate by etching the substrate, and then, after forming a new mask on the substrate and forming a plurality of second openings in the new mask, the second recess portions are formed in the substrate by etching the substrate.
2. The method of manufacturing a substrate with recess portions for microlenses according to claim 1 , wherein after forming a plurality of openings in a mask formed on the substrate, the first recess portions and the second recess portions are formed on the substrate by etching the substrate.
3. The method of manufacturing a substrate with recess portions for microlenses according to claim 1 , wherein after forming an etchable mask on the substrate to a predetermined thickness, and forming a plurality of first and second openings in the mask, the first recess portions and the second recess portions are formed in the substrate by etching the substrate.
4. A method of manufacturing a substrate with recess portions for forming microlenses, comprising:
forming a plurality of first openings in a first mask formed on the substrate;
forming a plurality of first recess portions in the substrate by carrying out a first etching process to the substrate through the first mask after the plurality of first openings are formed;
forming a plurality of second openings in a second mask formed on the substrate after the first etching processing is carried out, the second openings being located between positions where the first openings were located in the first mask; and
forming a plurality of second recess portions in the substrate by carrying out a second etching processing to the substrate through the second mask after the plurality of second openings are formed, the second recess portions having a size that differs from the first recess portions.