Method of adjusting photonic bandgap of photonic crystal, method of manufacturing reflective color filter using the same, and display device including the reflective color filter
Provided are a method of adjusting a photonic bandgap of a photonic crystal, a method of manufacturing a reflective color filter using the same, and a display device including the reflective color filter. The method of adjusting a photonic bandgap of a photonic crystal includes forming the photonic crystal having a photonic bandgap on a substrate, and changing the photonic bandgap by irradiating light onto the photonic crystal. In addition, the display device includes a backlight, a transflective liquid crystal panel including liquid crystal cells sealed between first and second substrates. Each liquid crystal cell corresponding to a pixel includes a transmissive area and a reflective area. A transmissive color filter is formed on the first substrate, which faces the backlight, and a reflective color filter is formed on each reflective area.
1. A method of adjusting a photonic bandgap of a photonic crystal, the method comprising:
forming the photonic crystal having a photonic bandgap on a substrate; and
changing the photonic bandgap by irradiating light onto the photonic crystal,
wherein the forming comprises:
growing spherical colloid particles on the substrate using a colloid self-assembly method;
filling a space between the spherical colloid particles with a material having an effective refractive index which can be changed by light; and
removing the spherical colloid particles.
2. The method of claim 1 , wherein the changing comprises changing the photonic bandgap of a part of the photonic crystal, smaller than the whole, by irradiating light only onto the part of the photonic crystal using a mask having an opening corresponding to the part of the photonic crystal to be changed.
3. The method of claim 2 , further comprising:
prior to forming the photonic crystal,
forming an insulating barrier rib at an interface between a first part and a second part of the photonic crystal.
4. The method of claim 1 , wherein the changing comprises changing the photonic bandgap by adjusting the a dosage or an exposure time of the light, wherein the light is one of infrared light and visible light.
5. The method of claim 1 , wherein the photonic crystal comprises one of a material in which phase-transition occurs due to heat, and a material in which nano pores are generated by heat.
6. The method of claim 5 , wherein the changing comprises scanning light, comprising one of a laser beam and focused light, onto the photonic crystal and changing the photonic bandgap by adjusting one of an output and a scan time of the light.
7. A method of manufacturing a reflective color filter, the method comprising:
forming a photonic crystal having a first photonic bandgap corresponding to a first color on a transparent substrate, the photonic crystal having at least first, second, and third non-overlapping regions;
adjusting a photonic bandgap of the second region, to a second photonic bandgap corresponding to a second color by irradiating light to a the second region using a mask which has an opening corresponding to the second region and which covers the first and third regions of the photonic crystal; and
adjusting a photonic bandgap of the third region, to a third photonic bandgap corresponding to a third color by irradiating light to the third region using a mask which has an opening corresponding to the third region,
wherein the photonic crystal comprises a material of which an effective refractive index is changed by light or heat.
8. The method of claim 7 , wherein the first color is one of blue and red.
9. The method of claim 7 , wherein the forming comprises growing spherical colloid particles on the substrate using a colloid self-assembly method.
10. The method of claim 7 , wherein the forming comprises:
growing spherical colloid particles on the substrate using a colloid self-assembly method;
filling a space between the spherical colloid particles with a material having an effective refractive index which is changed by light; and
removing the spherical colloid particles.
11. The method of claim 7 , further comprising:
prior to forming the photonic crystal,
forming insulating barrier ribs on the substrate at interfaces between the first, second, and third regions.
12. The method of claim 7 , wherein adjusting the photonic bandgap of the second region comprises changing the photonic bandgap of the second region from the first photonic bandgap to the second photonic bandgap by adjusting a dosage or an exposure time of the light irradiated onto the second region, wherein the light is one of infrared rays and visible rays.
13. The method of claim 7 , wherein adjusting the photonic bandgap of the third region comprises changing the photonic bandgap of the third region from the first photonic bandgap to the third photonic bandgap by adjusting a dosage or an exposure time of the light irradiated onto the second region, wherein the light is one of infrared rays and visible rays.
14. The method of claim 7 , wherein the photonic crystal comprises one of a material in which a phase-transition occurs due to heat, and a material in which nano pores are generated by heat.
15. The method of claim 14 , wherein adjusting the photonic bandgap of the second region comprises scanning a laser beam over the second region, and changing the photonic bandgap of the second region from the first photonic bandgap to the second photonic bandgap by adjusting a dosage or a scan time of the laser beam.
16. The method of claim 14 , wherein adjusting the photonic bandgap of the third region comprises scanning a laser beam over the third region, and changing the photonic bandgap of the third region from the first photonic bandgap to the third photonic bandgap by adjusting a dosage or a scan time of the laser beam.