IP Library Granted Patent US 7,974,130
Granted Patent B2
US 7,974,130 · App. 11/944,803 · Granted Jul 5, 2011

Semiconductor memory device and method for erasing the same

Assignee: Kabushiki Kaisha Toshiba
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Quick Facts
Patent No.
US 7,974,130
App. No.
11/944,803
Granted
Jul 5, 2011
Kind
B2
Abstract

A semiconductor memory device including a memory cell array with NAND cell units arranged therein, the NAND cell unit having a plurality of electrically rewritable and non-volatile memory cells connected in series, first and second select gate transistors disposed for coupling the both ends of the NAND cell unit to a bit line and a source line, respectively, and a dummy cell disposed adjacent to at least one of the first and second select gate transistors, wherein after erasing the memory cells in an erase unit, the memory cells excepting the dummy cell are subject to soft-program.

Claims (29)

1. A semiconductor memory device comprising:

a memory cell array with NAND cell units arranged therein, the NAND cell unit having a plurality of electrically rewritable and non-volatile memory cells connected in series, first and second select gate transistors disposed for coupling the both ends of the NAND cell unit to a bit line and a source line, respectively, and a dummy cell disposed adjacent to at least one of the first and second select gate transistors, and

a sequence controller configured to control the memory cell array such that

prior to erasing the memory cells and the dummy cell in an erase unit, at least the dummy cell is subject to pre-program for boosting threshold voltage thereof as a part of an erase sequence, and

after erasing the memory cells and the dummy cell in the erase unit, the memory cells are applied with a first program voltage to be subject to soft-program, and the dummy cell is applied with a first program pass voltage lower than the first program voltage as part of the erase sequence, and

after the erase sequence, a selected memory cell in the memory cells is applied with a second program voltage to be subject to program, non-selected memory cells in the memory cells are applied with a second program pass voltage lower than the second program voltage, and the dummy cell is applied with a third program pass voltage lower than the second program pass voltage.

2. The semiconductor memory device according to claim 1 , wherein

there are dummy cells disposed adjacent to the first and second select gate transistors, and wherein

prior to erasing the memory cells and the dummy cells in the erase unit, the dummy cells are subject to pre-program for boosting threshold voltage thereof.

3. The semiconductor memory device according to claim 2 , wherein

the pre-program is performed by only one program voltage application without a program-verify operation.

4. The semiconductor memory device according to claim 1 , wherein

prior to erasing the memory cells and the dummy cell in the erase unit, the memory cells and the dummy cell are subject to pre-program for boosting threshold voltage thereof.

5. The semiconductor memory device according to claim 4 , wherein

the pre-program is performed by only one program voltage application without a program-verify operation.

6. The semiconductor memory device according to claim 1 , wherein

the soft-program is based on a step-up program scheme, in which program voltage applications and program-verify operations are repeated.

7. A method for operating a semiconductor memory device comprising a memory cell array with NAND cell units arranged therein, the NAND cell unit having a plurality of electrically rewritable and non-volatile memory cells connected in series and a dummy cell disposed adjacent to a select gate transistor at one end of the NAND cell unit, including an erase sequence, wherein the erase sequence comprising:

pre-programming at least the dummy cell in an erase unit for boosting threshold voltage thereof;

erasing the memory cells and the dummy cell in the erase unit; and

soft-programming the memory cells in the erase unit by applying a program voltage to the memory cells while applying a program pass voltage lower than the program voltage to the dummy cell.

8. The method according to claim 7 , wherein

the pre-programming procedure is performed by only one program voltage application without a program-verify operation.

9. The method according to claim 7 , wherein

the soft-programming procedure is based on a step-up program scheme, in which program voltage applications and program-verify operations are repeated.

10. The method according to claim 7 , further including:

programming after the erase sequence by applying a second program voltage to a selected memory cell in the memory cells;

applying a second program pass voltage lower than the second program voltage to non-selected memory cells in the memory cells; and

applying a third program pass voltage lower than the second program pass voltage to the dummy cell.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 21, 2008
From: NAKAMURA, DAI; HOSONO, KOJI
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 020543/0225 →
Priority Claims (1)
JP 2006-319428 · Nov 28, 2006 · national
Continuity (1)
Related Publication 20080137409A1 · Jun 12, 2008