Integrated deflectors for beam alignment and blanking in charged particle columns
A charged particle beam column package includes an assembly (e.g., comprising a plurality of layers, which can have a component coupled to one of the layers), and at least one deflector between an extractor and aperture of the assembly. Further, at least one of the layers has interconnects thereon.
1. A charged particle beam column package, comprising:
an assembly of layers comprising at least one deflector sandwiched between a limiting aperture and an extractor; and
at least one controlled impedance line coupled to the deflector.
2. The beam column package of claim 1 , wherein the layers are made from ceramic.
3. The beam column package of claim 2 , wherein the layers are made from HTCC.
4. The beam column package of claim 1 , wherein the deflector includes a multipole deflector.
5. The beam column package of claim 1 , wherein the deflector comprises two or more sets of poles and wherein the sets of poles are activated in-phase or out-of-phase, thereby blanking, tilting or shifting the beam with respect to the optic axis of the column.
6. The beam column package of claim 1 , wherein the deflector is positioned directly beneath the extractor.
7. The package of claim 1 , wherein the deflector, limiting aperture layer and extractor form a single component.
8. A scanning charged particle microscope, comprising:
an assembly of layers comprising at least one deflector sandwiched between a limiting aperture and an extractor;
an electron source adjacent to the assembly;
at least one controlled impedance line coupled to the deflector; and
a sample holder adjacent to the assembly.
9. A method, comprising:
generating a charged particle beam;
focusing the beam with a charged particle beam column package, the beam column package having an assembly of layers, the layers comprising at least one deflector sandwiched between a limiting aperture and an extractor;
aligning the beam using the at least one deflector;
scanning the beam over a target with a component other than the deflector; and
controlling the deflector using at least one controlled impedance line.
10. The method of claim 9 , wherein the layers are made from ceramic.
11. The method of claim 10 , wherein the layers are made from HTCC.
12. The method of claim 10 , wherein the deflector includes a multipole deflector.
13. The method of claim 10 , wherein the deflector comprises two or more sets of poles and wherein the method further comprises activating the sets of poles in-phase or out-of-phase, thereby blanking, tilting or shifting the beam with respect to the optical axis of the column.
14. The method of claim 10 , wherein the deflector is positioned directly beneath the extractor.
15. A charged particle beam column package, comprising:
an assembly of layers comprising at least one deflector sandwiched between a limiting aperture and an extractor; and
wherein the deflector includes at least one termination pad.
16. A method, comprising:
generating a charged particle beam;
focusing the beam with a charged particle beam column package, the beam column package having an assembly of layers, the layers comprising at least one deflector sandwiched between a limiting aperture and an extractor, the deflector comprising at least one termination pad;
aligning the beam using the at least one deflector; and
scanning the beam over a target with a component other than the deflector.