Method of improving electrode tissue interface
A critical element of a retinal prosthesis is the stimulating electrode array, which is placed in close proximity to the retina. It is via this interface that a retinal prosthesis electrically stimulates nerve cells to produce the perception of light. The impedance load seen by the current driver consists of the tissue resistance and the complex electrode impedance. The results show that the tissue resistance of the retina is significantly greater than that of the vitreous humor in the eye. Circuit models of the electrode-retina interface are used to parameterize the different contributors to the overall impedance.
1. A method of optimizing an electrode tissue interface comprising:
implanting at least one electrode in the vicinity of visual neural tissue;
electrically stimulating the visual neural tissue through the at least one electrode, wherein a stimulation signal to each electrode comprises one or more pulses, and wherein frequency of each of the one or more pulses is within a first frequency range;
measuring impedance of the electrode tissue interface to obtain an impedance measurement;
adjusting the frequency of at least one pulse in the one or more pulses to be within a second frequency range based on said impedance measurement, wherein the second frequency range is narrower than the first frequency range; and
altering location of said at least one electrode based on said impedance measurement and said second frequency range.
2. The method of claim 1 , wherein distance between neighboring electrodes is from 1 mm-5 mm.
3. The method of claim 2 , wherein the distance between neighboring electrodes is from 2 mm-3 mm.
4. The method of claim 3 , wherein the distance between neighboring electrodes is from 2.2 mm-2.5 mm.
5. The method of claim 1 , wherein the diameter of the at least one electrode is from 10 μm to 250 μm.
6. The method of claim 5 , wherein the diameter of the at least one electrode is from 40 μm to 250 μm.
7. The method of claim 1 , wherein the electrode spacing is from 600 μm to 1000 μm center to center in the horizontal and vertical direction.
8. The method of claim 1 , wherein the altering is from a first location to a second location, and wherein impedance of the electrode tissue interface is higher at the second location than at the first location.
9. The method of claim 1 , further comprising adjusting at least one of amplitude and duration of a full set or subset of the one or more pulses based on said impedance measurement.
10. The method of claim 1 , further comprising adjusting at least one of arrangement and dimensions of electrodes in the at least one electrode based on said impedance measurement.
11. The method of claim 1 , wherein the first frequency range is from 10 Hz to 100 kHz.
12. The method of claim 1 , further comprising modeling the electrode tissue interface using a circuit model, the circuit model comprising a series resistance and a polarization impedance, wherein:
the value of each of the series resistance and the polarization impedance is based on the impedance measurement, and
the series resistance is a function of the location of the at least one electrode and the polarization impedance is a function of surface quality of each electrode in the at least one electrode.
13. The method of claim 12 , wherein the altering is further based on the series resistance.
14. The method of claim 12 , further comprising adjusting the surface quality of a full set or subset of electrodes in the at least one electrode to increase the polarization impedance.
15. The method of claim 1 , further comprising modeling the electrode tissue interface using a circuit model, wherein:
the circuit model comprises a series resistance and a constant phase element in series, and
the magnitude and phase of each of the series resistance and the constant phase element is a function of the impedance measurement.
16. The method of claim 15 , wherein the series resistance ranges from 1 kilo ohm to 80 kilo ohms.
17. The method of claim 15 , wherein the magnitude of the constant phase element ranges from 20 nano siemens to 400 nano siemens.