Light emitting device fabrication method thereof, and light emitting apparatus
A light emitting device is provided. The light emitting device comprises a conductive substrate, a reflection layer, a support layer, an ohmic contact layer, and a light emitting semiconductor layer. The reflection layer is disposed on the conductive substrate. The support layer is disposed partially on the reflection layer. The ohmic contact layer is disposed at the side of the support layer. The light emitting semiconductor layer is disposed on the ohmic contact layer and the support layer.
1. A light emitting device comprising:
a conductive substrate;
a reflection layer on the conductive substrate;
an adhesion layer on the reflection layer;
an adhesion reinforcement layer disposed partially on the adhesion layer;
an ohmic contact layer on the adhesion layer disposed between the adhesion reinforcement layers; and
a light emitting semiconductor layer on the ohmic contact layer and the adhesion reinforcement layer,
wherein a portion of the adhesion reinforcement layer adjacent to the reflection layer is wider than a portion of the adhesion reinforcement layer adjacent to the light emitting semiconductor layer.
2. The light emitting device of claim 1 , wherein a portion of a bottom surface and a lateral surface of the adhesion reinforcement layer is surrounded by the adhesion layer.
3. The light emitting device of claim 1 , wherein a top surface of the adhesion reinforcement layer is coplanar with a top surface of the ohmic contact layer.
4. The light emitting device of claim 1 , further comprising an etching protective layer disposed on periphery of a top surface of the adhesion layer.
5. The light emitting device of claim 1 , wherein the adhesion reinforcement layer includes a GaN material or a material including Zn.
6. The light emitting device of claim 1 , further comprising a seed layer between the conductive substrate and the reflection layer.
7. The light emitting device of claim 1 , wherein the adhesion reinforcement layer is thicker than the ohmic contact layer.