Substrate having film pattern and manufacturing method of the same, manufacturing method of semiconductor device, liquid crystal television, and EL television
View Patent ↗The invention provides a manufacturing method of a substrate having a film pattern including an insulating film, a semiconductor film, a conductive film and the like by simple steps, and also a manufacturing method of a semiconductor device which is low in cost with high throughput and yield. According to the invention, after forming a first protective film which has low wettability on a substrate, a material which has high wettability is applied or discharged on an outer edge of a first mask pattern, thereby a film pattern and a substrate having the film pattern are formed.
1. A method for manufacturing a semiconductor device comprising the steps of:
discharging a solution in contact with a source electrode and a drain electrode to form a first mask pattern having a liquid repellent surface;
discharging a lyophilic solution on an outer edge of the first mask pattern to form an interlayer insulating film; and
forming a conductive film which connects to the source electrode and the drain electrode after removing the first mask pattern.
2. The method according to claim 1 , wherein the conductive film is a pixel electrode.
3. The method according to claim 1 , wherein the semiconductor device comprises a transistor selected from the group consisting of a thin film transistor, a field effect transistor, and an organic semiconductor transistor.
4. The method according to claim 3 , wherein the thin film transistor has a structure selected from the group consisting of a top gate structure, a bottom gate structure, a coplanar structure and an inverted stagger structure.
5. A method for manufacturing a semiconductor device comprising the steps of:
discharging a solution in contact with a source electrode and a drain electrode to form a first mask pattern having a liquid repellent surface;
discharging a lyophilic solution on an outer edge of the first mask pattern to form an interlayer insulating film; and
forming a conductive film which connects to the source electrode or the drain electrode on the interlayer insulating film by discharging a paste.
6. The method according to claim 5 , wherein the conductive film is a pixel electrode.
7. The method according to claim 5 , wherein the semiconductor device comprises a transistor selected from the group consisting of a thin film transistor, a field effect transistor, and an organic semiconductor transistor.
8. The method according to claim 7 , wherein the thin film transistor has a structure selected from the group consisting of a top gate structure, a bottom gate structure, a coplanar structure and an inverted stagger structure.
9. A method for manufacturing a semiconductor device comprising the steps of:
discharging a solution in contact with a source electrode and a drain electrode to form a first mask pattern having a liquid repellent surface;
discharging a lyophilic solution on an outer edge of the first mask pattern to form an interlayer insulating film including a resin; and
forming a conductive film which connects to the source electrode and the drain electrode after removing the first mask pattern.
10. The method according to claim 9 , wherein the conductive film is a pixel electrode.
11. The method according to claim 9 , wherein the semiconductor device comprises a transistor selected from the group consisting of a thin film transistor, a field effect transistor, and an organic semiconductor transistor.
12. The method according to claim 11 , wherein the thin film transistor has a structure selected from the group consisting of a top gate structure, a bottom gate structure, a coplanar structure and an inverted stagger structure.
13. A method for manufacturing a semiconductor device comprising the steps of:
discharging a solution in contact with a source electrode and a drain electrode to form a first mask pattern having a liquid repellent surface;
discharging a lyophilic solution on an outer edge of the first mask pattern to form an interlayer insulating film including a resin; and
forming a conductive film which connects to the source electrode or the drain electrode on the interlayer insulating film by discharging a paste.
14. The method according to claim 13 , wherein the conductive film is a pixel electrode.
15. The method according to claim 13 , wherein the semiconductor device comprises a transistor selected from the group consisting of a thin film transistor, a field effect transistor, and an organic semiconductor transistor.
16. The method according to claim 15 , wherein the thin film transistor has a structure selected from the group consisting of a top gate structure, a bottom gate structure, a coplanar structure and an inverted stagger structure.