IP Library Granted Patent US 8,067,808
Granted Patent B2
US 8,067,808 · App. 12/784,524 · Granted Nov 29, 2011

Apparatus of memory array using FinFETs

Assignee: Infineon Technologies AG
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Quick Facts
Patent No.
US 8,067,808
App. No.
12/784,524
Granted
Nov 29, 2011
Kind
B2
Abstract

A memory cell includes a FinFET select device and a memory element. In some embodiments a memory cell has a contact element coupled between a surface of the fin and the memory element.

Claims (20)

1. A memory device, comprising:

a FinFET select device having a fin; and

a memory element, wherein the FinFET select device has a contact element coupled between a surface of the fin and the memory element, said contact element being in direct contact with a source/drain region of the fin.

2. The memory device of claim 1 , wherein the contact element partially wraps around the fin.

3. The memory device of claim 1 , wherein the contact element is an embedded memory element.

4. The memory device of claim 1 , wherein the memory element is a NVM.

5. The memory device of claim 4 , wherein the memory element is selected from a group of memory elements consisting of PCRAM, MRAM, CBRAM, and FeRAM.

6. The memory device of claim 1 , wherein said FinFET further comprises a gate line coupled to the fin.

7. The memory device of claim 1 , wherein said contact element is in direct contact with a top surface of the fin.

8. The memory device of claim 1 , wherein said contact element comprises a conductor material.

9. A memory device, comprising:

a FinFET select device having a fin; and

a memory element, wherein the FinFET select device has a contact element coupled between a surface of the fin and the memory element, said contact element being in direct contact with a drain region of said fin.

10. The memory device of claim 9 , wherein the contact element partially wraps around the fin.

11. The memory device of claim 9 , wherein the contact element is an embedded memory element.

12. The memory device of claim 9 , wherein the memory element is a NVM.

13. The memory device of claim 9 , wherein the memory element is selected from a group of memory elements consisting of PCRAM, MRAM, CBRAM, and FeRAM.

14. The memory device of claim 9 , wherein the memory element is in direct contact with a top surface of said fin.

15. The memory device of claim 9 , wherein the contact element comprises a conductor material.

16. The memory element of claim 9 , wherein said memory element is coupled between the contact element and a bit line.

Assignments (2)
CORRECTIVE ASSIGNMENT TO CORRECT THE EXECUTION DATE PREVIOUSLY RECORDED AT REEL: 71984 FRAME: 618. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Aug 19, 2025
From: INFINEON TECHNOLOGIES AG
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 072496/0759 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 11, 2025
From: INFINEON TECHNOLOGIES AG
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 071984/0618 →
Continuity (2)
Continuation 11734069 · Apr 11, 2007
Related Publication 20100252799A1 · Oct 7, 2010