Base soluble polymers for photoresist compositions
View Patent ↗Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at α-position and/or β-position and/or γ-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected are described.
1. An antireflective composition comprising:
(a) a base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at α-position and/or β-position and/or γ-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected, and where the base polymer has a sulfonyl group in the backbone of the polymer; and
(b) at least one crosslinking agent.
2. The composition of claim 1 where in the base soluble polymer the pKa of the hydroxyl group is less than 14.
3. The composition of claim 1 where in the base soluble polymer the pKa of the hydroxyl group is less than 10.
4. The composition of claim 1 where in the base soluble polymer the carbon atom at the α-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected.
5. The composition of claim 1 where in the base soluble polymer the carbon atom at the β-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected.
6. The composition of claim 1 where in the base soluble polymer the carbon atoms at the α-position and β-position with respect to the sulfonyl group have hydroxyl groups, where the hydroxyl group is protected or unprotected.
7. The composition of claim 1 where in the base soluble polymer where two carbon atoms at the α-position with respect to the sulfonyl group have hydroxyl groups, where the hydroxyl group is protected or unprotected.
8. The composition of claim 1 where in the base soluble polymer the carbon atoms at the α-position and γ-position with respect to the sulfonyl group have hydroxyl groups, where the hydroxyl group is protected or unprotected.
9. The composition of claim 1 where in the base soluble polymer two carbon atoms at the β-position with respect to the sulfonyl group have hydroxyl groups, where the hydroxyl group is protected or unprotected.
10. The composition of claim 1 where in the base soluble polymer two carbon atoms at the γ-position with respect to the sulfonyl group have hydroxyl groups, where the hydroxyl group is protected or unprotected.
11. The composition of claim 1 where in the base soluble polymer the carbon atom at the γ-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected.
12. The composition of claim 1 where in the base soluble polymer the carbon atoms at the β-position and γ-position with respect to the sulfonyl group have hydroxyl groups, where the hydroxyl group is protected or unprotected.
13. The composition of claim 1 where the base soluble polymer further comprises monomeric unit derived from a monomer selected from an aromatic vinyl, vinyl ether, acrylate, methacrylate and alkene.
14. A process for forming an image on a substrate comprising:
a) coating the substrate with the composition of claim 1 ;
b) heating the coating of step a);
c) forming a coating from a photoresist solution on the coating of step b);
d) heating the photoresist coating to substantially remove solvent from the coating;
e) image-wise exposing the photoresist coating;
f) developing an image using an aqueous alkaline developer;
g) optionally, heating the substrate prior to and after development; and
h) dry etching the composition of step b).
15. The composition of claim 1 where the crosslinker is selected from a glycoluril-formadehyde resin, a melamine-formaldehyde resin, benzoquanamine-formaldehyde resin and urea-formaldehyde resin.
16. An antireflective composition comprising:
(a) a base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at α-position and/or β-position and/or γ-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected, and where the base polymer has a sulfonyl group in the backbone of the polymer; and
(b) at least one crosslinking agent which is a glycoluril-formadehyde resin.
17. The composition of claim 16 where in the base soluble polymer the pKa of the hydroxyl group is less than 14.